An investigation of the properties of Ti-C:H films

The relationship between deposition parameters and the properties of multilayered Ti-C:H films has been investigated, in particular, the effect of acetylene flow and r.f. bias on the mechanical properties, electrical properties and reflectance of the coating. The coating investigated was a multilaye...

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Bibliographic Details
Published in:Surface & coatings technology 1997-10, Vol.94 (1-3), p.652-657
Main Authors: LoBiondo, Nicholas E., Aharonov, Robert R., Fontana, Raymond P.
Format: Article
Language:English
Subjects:
Acetylene flow
Bias voltage
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Deposition parameters
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Ti-C:H films
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Summary:The relationship between deposition parameters and the properties of multilayered Ti-C:H films has been investigated, in particular, the effect of acetylene flow and r.f. bias on the mechanical properties, electrical properties and reflectance of the coating. The coating investigated was a multilayered design with Ti, TiN, TiCN and TiC underlayers; however, this study focuses on the properties of an outer Ti-C:H film, which contains less than 15 at.% titanium. Ti-C:H films with Vickers hardness values ranging from 500 to 1200 Vickers, an elastic modulus from 50 to 110 GPa, specific resistivities approaching 1 GΩ cm and a dielectic constant of 3.2 can be produced depending on the deposition parameters. The coating can be deposited with a low reflectance which is suggested to be an indicator of film composition.
ISSN:0257-8972
1879-3347
DOI:10.1016/S0257-8972(97)00517-3