Ring etching zones on magnetron sputtering targets

A practical and theoretical investigation into a method for estimating the forms and dimensions of etching zones on magnetron sputtering targets is presented. This estimation is based on detailed geometry considerations of the internal arrangement of the vacuum chamber and the sputtering parameters....

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Bibliographic Details
Published in:Thin solid films 1997-05, Vol.300 (1), p.72-77
Main Authors: Golan, G., Axelevitch, A.
Format: Article
Language:English
Subjects:
Coatings
Corrosion
Ion bombardment
Sputtering
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Summary:A practical and theoretical investigation into a method for estimating the forms and dimensions of etching zones on magnetron sputtering targets is presented. This estimation is based on detailed geometry considerations of the internal arrangement of the vacuum chamber and the sputtering parameters. It is proved theoretically and experimentally that etching zones on sputtering targets are in a ring shape and that their location and dimensions are independent on the target material or dimensions.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(96)09498-9