Surface characterization of titanium oxide films synthesized by ion beam enhanced deposition

• Published in: Thin solid films 1997-11, Vol.310 (1), p.29-33
• Main Authors: Zhang, Feng, Jin, S., Mao, Yingjun, Zheng, Zhihong, Chen, Yu, Liu, Xianghuai
• Format: Article
• Language: English
• Subjects: Auger electron spectroscopy; Composition and phase identification; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Electron beams; Exact sciences and technology; Film preparation; Ion and electron beam-assisted deposition; ion plating; Ion beam enhanced deposition; Ion bombardment; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Oxidation; Physics; Sputter deposition; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Synthesis (chemical); Thin film structure and morphology; Titanium oxide; Titanium oxides; Vapor deposition; X ray photoelectron spectroscopy
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/S0040-6090(97)00338-6

In this article, titanium oxide films were prepared by ion beam enhanced deposition where titanium was evaporated by electron beam and simultaneously bombarded with xenon ion beams at an energy of 40 keV in an O 2 environment. X-ray photoelectron spectroscopy and Auger electron spectroscopy were used to research the chemical state and composition of the titanium oxide films. The results show that surface of the film was fully oxidized. After the surface was removed by argon ion sputtering, the results show that Ti 2+, Ti 3+ and Ti 4+ states exist on the sputtered surface. The atomic concentration of all the three titanium states were calculated. The chemical shift of O 1s peak was also observed on the near surface.