Structure of mullite coatings grown by chemical vapor deposition

Dense mullite coatings have been deposited on SiC and Si 3N 4 substrates by chemical vapor deposition (CVD). The coatings were compositionally graded with the Al/Si ratio increasing from 1.5 at the substrate/coating interface, to a value of 8 at the coating surface. This gradation of composition is...

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Bibliographic Details
Published in:Materials science & engineering. A, Structural materials : properties, microstructure and processing Structural materials : properties, microstructure and processing, 1997-07, Vol.231 (1), p.48-54
Main Authors: Doppalapudi, D, Basu, S.N
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Mullite coating
Physics
Structure
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
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Summary:Dense mullite coatings have been deposited on SiC and Si 3N 4 substrates by chemical vapor deposition (CVD). The coatings were compositionally graded with the Al/Si ratio increasing from 1.5 at the substrate/coating interface, to a value of 8 at the coating surface. This gradation of composition is discussed in light of changes in the concentration of oxygen vacancies, ordering of the vacancies, formation and size of domains and the observed changes in lattice parameters.
ISSN:0921-5093
1873-4936
DOI:10.1016/S0921-5093(97)00075-0