Temperature dependence of the photoelectron emission from intentionally oxidized copper

The characteristics of the photoelectron emission (PE), measured by varying the wavelength of incident light, form copper subjected to oxidation treatment in air have been investigated as a function of the measurement temperature between 25 and 300°C using a gas-flow counter. The intensity of PE at...

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Bibliographic Details
Published in:Applied surface science 1997-08, Vol.115 (4), p.317-325
Main Authors: Terunuma, Y, Takahashi, K, Yoshizawa, T, Momose, Y
Format: Article
Language:English
Subjects:
Adsorbed layers and thin films
Applied sciences
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electron and ion emission by liquids and solids
impact phenomena
Exact sciences and technology
Gas-flow counter
Metals. Metallurgy
Oxidized copper
Photoelectron emission
Photoemission and photoelectron spectra
Physics
Surface potential
XPS
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Summary:The characteristics of the photoelectron emission (PE), measured by varying the wavelength of incident light, form copper subjected to oxidation treatment in air have been investigated as a function of the measurement temperature between 25 and 300°C using a gas-flow counter. The intensity of PE at a certain measurement temperature decreased with increasing oxidation temperature (100 to 800°C) and the intensity of PE for a given oxidation temperature increased with decreasing measurement temperature. The PE behavior was correlated to the chemical and electrical nature of the surfaces analyzed by X-ray photoelectron spectroscopy and surface potential measurement. A mechanism is proposed for the PE of the untreated sample which exhibited a completely different PE behavior.
ISSN:0169-4332
1873-5584
DOI:10.1016/S0169-4332(97)00115-3