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X-ray reflectivity study on gold films during sputter deposition
We performed in-situ X-ray reflectivity measurements of gold films during sputter deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after de...
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Published in: | Surface science 1997-05, Vol.380 (2), p.245-257 |
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container_title | Surface science |
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creator | Chiarello, R.P. You, H. Kim, H.K. Roberts, T. Kempwirth, R.T. Miller, D. Gray, K.E. Vandervoort, K.G. Trivedi, N. Phillpot, S.R. Zhang, Q.J. Williams, S. Ketterson, J.B. |
description | We performed in-situ X-ray reflectivity measurements of gold films during sputter deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their real-space topographic images. These images were used to complement the X-ray reflectivity measurements in determining the effect of argon pressure on the gold surface and its height-height difference functions. An approximation for height-height difference functions was employed to analyze the X-ray reflectivity data. The measured interface width during growth followed a simple power law, consistent with recent theoretical results of dynamic scaling behavior. The scaling exponents, however, do not agree well with predictions based on some models in 2 + 1 dimensions. |
doi_str_mv | 10.1016/S0039-6028(96)01406-9 |
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The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their real-space topographic images. These images were used to complement the X-ray reflectivity measurements in determining the effect of argon pressure on the gold surface and its height-height difference functions. An approximation for height-height difference functions was employed to analyze the X-ray reflectivity data. The measured interface width during growth followed a simple power law, consistent with recent theoretical results of dynamic scaling behavior. The scaling exponents, however, do not agree well with predictions based on some models in 2 + 1 dimensions.</description><identifier>ISSN: 0039-6028</identifier><identifier>EISSN: 1879-2758</identifier><identifier>DOI: 10.1016/S0039-6028(96)01406-9</identifier><identifier>CODEN: SUSCAS</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Applied sciences ; Atomic force microscopy ; Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Gold ; Growth ; Metallic films ; Metallic surfaces ; Metals. Metallurgy ; Models of non-equilibrium phenomena ; Non-equilibrium thermodynamics and statistical mechanics ; Physics ; Polycrystalline surfaces ; Polycrystalline thin films ; Scanning tunneling microscopy ; Silicon ; Solid surfaces and solid-solid interfaces ; Solid-gas interfaces ; Sputtering ; Surface roughening ; Surface structure and topography ; Surface structure, morphology, roughness, and topography ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; X-ray scattering, diffraction, and reflection</subject><ispartof>Surface science, 1997-05, Vol.380 (2), p.245-257</ispartof><rights>1997</rights><rights>1997 INIST-CNRS</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c414t-9183b8940c5bcccd32a0e83eba174b816589516f924c08ded348859e2f2d0a6e3</citedby><cites>FETCH-LOGICAL-c414t-9183b8940c5bcccd32a0e83eba174b816589516f924c08ded348859e2f2d0a6e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2712183$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Chiarello, R.P.</creatorcontrib><creatorcontrib>You, H.</creatorcontrib><creatorcontrib>Kim, H.K.</creatorcontrib><creatorcontrib>Roberts, T.</creatorcontrib><creatorcontrib>Kempwirth, R.T.</creatorcontrib><creatorcontrib>Miller, D.</creatorcontrib><creatorcontrib>Gray, K.E.</creatorcontrib><creatorcontrib>Vandervoort, K.G.</creatorcontrib><creatorcontrib>Trivedi, N.</creatorcontrib><creatorcontrib>Phillpot, S.R.</creatorcontrib><creatorcontrib>Zhang, Q.J.</creatorcontrib><creatorcontrib>Williams, S.</creatorcontrib><creatorcontrib>Ketterson, J.B.</creatorcontrib><title>X-ray reflectivity study on gold films during sputter deposition</title><title>Surface science</title><description>We performed in-situ X-ray reflectivity measurements of gold films during sputter deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their real-space topographic images. These images were used to complement the X-ray reflectivity measurements in determining the effect of argon pressure on the gold surface and its height-height difference functions. An approximation for height-height difference functions was employed to analyze the X-ray reflectivity data. The measured interface width during growth followed a simple power law, consistent with recent theoretical results of dynamic scaling behavior. The scaling exponents, however, do not agree well with predictions based on some models in 2 + 1 dimensions.</description><subject>Applied sciences</subject><subject>Atomic force microscopy</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Gold</subject><subject>Growth</subject><subject>Metallic films</subject><subject>Metallic surfaces</subject><subject>Metals. Metallurgy</subject><subject>Models of non-equilibrium phenomena</subject><subject>Non-equilibrium thermodynamics and statistical mechanics</subject><subject>Physics</subject><subject>Polycrystalline surfaces</subject><subject>Polycrystalline thin films</subject><subject>Scanning tunneling microscopy</subject><subject>Silicon</subject><subject>Solid surfaces and solid-solid interfaces</subject><subject>Solid-gas interfaces</subject><subject>Sputtering</subject><subject>Surface roughening</subject><subject>Surface structure and topography</subject><subject>Surface structure, morphology, roughness, and topography</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>X-ray scattering, diffraction, and reflection</subject><issn>0039-6028</issn><issn>1879-2758</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNqFkE1LxDAQhoMouK7-BCEHET1UkzRNk5PK4hcseFDBW0iT6RLptmuSLvTf2_3Aq3OZy_PO8D4InVNyQwkVt--E5CoThMkrJa4J5URk6gBNqCxVxspCHqLJH3KMTmL8JuNwVUzQ_VcWzIAD1A3Y5Nc-DTim3g24a_GiaxyufbOM2PXBtwscV31KELCDVRd98l17io5q00Q42-8p-nx6_Ji9ZPO359fZwzyznPKUKSrzSipObFFZa13ODAGZQ2VoyStJRSFVQUWtGLdEOnA5l7JQwGrmiBGQT9Hl7u4qdD89xKSXPlpoGtNC10fNSp4LWogRLHagDV2MYzG9Cn5pwqAp0RtfeutLb2RoJfTWl1Zj7mL_wERrmjqY1vr4F2YlZWOHEbvbYTCWXXsIOloPrQXnw2hQu87_8-gX035-4Q</recordid><startdate>19970515</startdate><enddate>19970515</enddate><creator>Chiarello, R.P.</creator><creator>You, H.</creator><creator>Kim, H.K.</creator><creator>Roberts, T.</creator><creator>Kempwirth, R.T.</creator><creator>Miller, D.</creator><creator>Gray, K.E.</creator><creator>Vandervoort, K.G.</creator><creator>Trivedi, N.</creator><creator>Phillpot, S.R.</creator><creator>Zhang, Q.J.</creator><creator>Williams, S.</creator><creator>Ketterson, J.B.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19970515</creationdate><title>X-ray reflectivity study on gold films during sputter deposition</title><author>Chiarello, R.P. ; You, H. ; Kim, H.K. ; Roberts, T. ; Kempwirth, R.T. ; Miller, D. ; Gray, K.E. ; Vandervoort, K.G. ; Trivedi, N. ; Phillpot, S.R. ; Zhang, Q.J. ; Williams, S. ; Ketterson, J.B.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c414t-9183b8940c5bcccd32a0e83eba174b816589516f924c08ded348859e2f2d0a6e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Applied sciences</topic><topic>Atomic force microscopy</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Gold</topic><topic>Growth</topic><topic>Metallic films</topic><topic>Metallic surfaces</topic><topic>Metals. Metallurgy</topic><topic>Models of non-equilibrium phenomena</topic><topic>Non-equilibrium thermodynamics and statistical mechanics</topic><topic>Physics</topic><topic>Polycrystalline surfaces</topic><topic>Polycrystalline thin films</topic><topic>Scanning tunneling microscopy</topic><topic>Silicon</topic><topic>Solid surfaces and solid-solid interfaces</topic><topic>Solid-gas interfaces</topic><topic>Sputtering</topic><topic>Surface roughening</topic><topic>Surface structure and topography</topic><topic>Surface structure, morphology, roughness, and topography</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>X-ray scattering, diffraction, and reflection</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chiarello, R.P.</creatorcontrib><creatorcontrib>You, H.</creatorcontrib><creatorcontrib>Kim, H.K.</creatorcontrib><creatorcontrib>Roberts, T.</creatorcontrib><creatorcontrib>Kempwirth, R.T.</creatorcontrib><creatorcontrib>Miller, D.</creatorcontrib><creatorcontrib>Gray, K.E.</creatorcontrib><creatorcontrib>Vandervoort, K.G.</creatorcontrib><creatorcontrib>Trivedi, N.</creatorcontrib><creatorcontrib>Phillpot, S.R.</creatorcontrib><creatorcontrib>Zhang, Q.J.</creatorcontrib><creatorcontrib>Williams, S.</creatorcontrib><creatorcontrib>Ketterson, J.B.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chiarello, R.P.</au><au>You, H.</au><au>Kim, H.K.</au><au>Roberts, T.</au><au>Kempwirth, R.T.</au><au>Miller, D.</au><au>Gray, K.E.</au><au>Vandervoort, K.G.</au><au>Trivedi, N.</au><au>Phillpot, S.R.</au><au>Zhang, Q.J.</au><au>Williams, S.</au><au>Ketterson, J.B.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>X-ray reflectivity study on gold films during sputter deposition</atitle><jtitle>Surface science</jtitle><date>1997-05-15</date><risdate>1997</risdate><volume>380</volume><issue>2</issue><spage>245</spage><epage>257</epage><pages>245-257</pages><issn>0039-6028</issn><eissn>1879-2758</eissn><coden>SUSCAS</coden><abstract>We performed in-situ X-ray reflectivity measurements of gold films during sputter deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their real-space topographic images. These images were used to complement the X-ray reflectivity measurements in determining the effect of argon pressure on the gold surface and its height-height difference functions. An approximation for height-height difference functions was employed to analyze the X-ray reflectivity data. The measured interface width during growth followed a simple power law, consistent with recent theoretical results of dynamic scaling behavior. The scaling exponents, however, do not agree well with predictions based on some models in 2 + 1 dimensions.</abstract><cop>Lausanne</cop><cop>Amsterdam</cop><cop>New York, NY</cop><pub>Elsevier B.V</pub><doi>10.1016/S0039-6028(96)01406-9</doi><tpages>13</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Applied sciences Atomic force microscopy Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Gold Growth Metallic films Metallic surfaces Metals. Metallurgy Models of non-equilibrium phenomena Non-equilibrium thermodynamics and statistical mechanics Physics Polycrystalline surfaces Polycrystalline thin films Scanning tunneling microscopy Silicon Solid surfaces and solid-solid interfaces Solid-gas interfaces Sputtering Surface roughening Surface structure and topography Surface structure, morphology, roughness, and topography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) X-ray scattering, diffraction, and reflection |
title | X-ray reflectivity study on gold films during sputter deposition |
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