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Antiferroelectric lead zirconate thin films derived from acetate precursors

Antiferroelectric PBZrO3 films derived from acetate precursors were fabricated on Pt/Ti-coated Si wafers and fused SiO2 at 700 C using an automatic dip-coating process. Films formed directly on the metallised Si wafer showed the coexistence of perovskite and pyrochlore phases. A pre-coated TiO2 laye...

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Bibliographic Details
Published in:Journal of materials science 1995-03, Vol.30 (5), p.1386-1390
Main Authors: LI, K. K, WANG, F, HAERTLING, G. H
Format: Article
Language:English
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Summary:Antiferroelectric PBZrO3 films derived from acetate precursors were fabricated on Pt/Ti-coated Si wafers and fused SiO2 at 700 C using an automatic dip-coating process. Films formed directly on the metallised Si wafer showed the coexistence of perovskite and pyrochlore phases. A pre-coated TiO2 layer of about 10 nm facilitated the formation of the desired perovskite phase. Films deposited on fused SiO2 exhibited interactions between Pb and SiO2 which inhibited the crystallisation of the films. In this case, a pre-coated TiO2 layer in the range 50-75 nm acted as a diffusion barrier layer, allowing the formation of the perovskite phase. Antiferroelectricity in the films was confirmed by x-ray superstructure, dielectric double hysteresis loops and d.c. bias behaviour at room temperature. The corresponding transverse electro optic properties were also measured for films deposited on fused SiO2. 22 refs.
ISSN:0022-2461
1573-4803
DOI:10.1007/BF00356149