Electrical and optical characterisations of reactively sputtered TiBN films

Titanium boronitride films are elaborated by D.C. magnetron sputtering of TiB sub 2 target in reactive Ar-N sub 2 gaseous mixtures. The effect of nitrogen flow rate and bias voltage on the film brilliance and on the film colour is presented. The electrical conductivity variation of TiBN coatings ver...

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Bibliographic Details
Published in:Materials for Advanced Metallization (MAM), European Workshop European Workshop, 2000-03, Vol.295 Suppl., p.330-332
Main Authors: Pierson, J F, Maniguet, S, Bauer, J P
Format: Article
Language:English
Online Access:Get full text
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Summary:Titanium boronitride films are elaborated by D.C. magnetron sputtering of TiB sub 2 target in reactive Ar-N sub 2 gaseous mixtures. The effect of nitrogen flow rate and bias voltage on the film brilliance and on the film colour is presented. The electrical conductivity variation of TiBN coatings versus nitrogen flow rate is also investigated. The observed electrical conductivity decrease is discussed taking into account the structure of the film and the nature of the phases identified by X- ray diffraction. Substrates include 32CrMoV13 steel.
ISSN:1266-0167