Investigation of the microstructure of ramp-type YBa sub(2)Cu sub(3)O sub(7- delta ) structures

We studied the morphology of ramps in YBa sub(2)Cu sub(3)O sub(7- delta ) films and, subsequently, the barrier layer. The ramps have been fabricated by Ar ion beam milling using standard photoresist masks. SEM and AFM showed the formation of tracks along the slope of the ramp, originating from the i...

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Bibliographic Details
Published in:Superconductor science & technology 2000-05, Vol.13 (5), p.522-526
Main Authors: Sato, H, Roesthuis, F J G, Sonnenberg, A H, Rijnders, AJHM, Rogalla, H, Blank, D H A
Format: Article
Language:English
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Summary:We studied the morphology of ramps in YBa sub(2)Cu sub(3)O sub(7- delta ) films and, subsequently, the barrier layer. The ramps have been fabricated by Ar ion beam milling using standard photoresist masks. SEM and AFM showed the formation of tracks along the slope of the ramp, originating from the irregular shape of the edge of the photoresist mask. A proposed modified reflowed resist and pre-annealing process show a significantly smoother ramp surface, important for the fabrication of reproducible Josephson junctions.
ISSN:0953-2048