Photoelectrodeposition of patterned cobalt films on silicon substrates

Cobalt films have been electrodeposited directly onto p-type (1 0 0) silicon substrates. Since electrons were required for reduction of the cobalt in solution, deposition only occurred in the presence of illumination. Projection of an optical grating onto the substrate during deposition demonstrated...

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Bibliographic Details
Published in:Journal of magnetism and magnetic materials 2002-04, Vol.242 (I), p.578-580
Main Authors: Souche, Y., Lévy, J.P., Wagner, E., Liénard, A., Alvarez-Prado, L., Collins, R.T.
Format: Article
Language:English
Subjects:
Electrodeposition
Ferromagnetic films
Pattern formation
Thin films—magnetic
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Summary:Cobalt films have been electrodeposited directly onto p-type (1 0 0) silicon substrates. Since electrons were required for reduction of the cobalt in solution, deposition only occurred in the presence of illumination. Projection of an optical grating onto the substrate during deposition demonstrated direct patterning of the Co which could lead to novel methods of defining magnetic structures on semiconductor substrates.
ISSN:0304-8853
DOI:10.1016/S0304-8853(01)01115-5