Statistical 3D ‘atomistic’ simulation of decanano MOSFETs

A 3D statistical ‘atomistic’ simulation technique has been developed to study the effect of the random dopant induced parameter fluctuations in aggressively scaled MOSFETs. Efficient implementation of the ‘atomistic’ simulation approach has been used to investigate the threshold voltage standard dev...

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Bibliographic Details
Published in:Superlattices and microstructures 2000-02, Vol.27 (2-3), p.215-227
Main Authors: Asenov, A., Slavcheva, G., Brown, A.R., Balasubramaniam, R., Davies, J.H.
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
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Summary:A 3D statistical ‘atomistic’ simulation technique has been developed to study the effect of the random dopant induced parameter fluctuations in aggressively scaled MOSFETs. Efficient implementation of the ‘atomistic’ simulation approach has been used to investigate the threshold voltage standard deviation and lowering in the case of uniformly doped MOSFETs, and in fluctuation-resistant architectures utilising epitaxial-layers and delta-doping. The effect of the random doping in the polysilicon gate on the threshold voltage fluctuations has also been thoroughly investigated. The influence of a single-charge trapping on the channel conductivity in decanano MOSFETs is studied in the ‘atomistic’ framework as well. Quantum effects are taken into consideration in our ‘atomistic’ simulations using the density gradient formalism.
ISSN:0749-6036
1096-3677
DOI:10.1006/spmi.1999.0805