Etching of CoNbZr Alloys in HF-Free Aqueous Solutions

The etching of the soft magnetic CoNbZr alloy in aqueous HF-free solutions containing H sub 2 O sub 2 was investigated. The influence of solution composition, temperature, and Nb content of the alloy on the etch rate was studied. X-ray photoelectron spectroscopy analyses were performed to examine th...

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Bibliographic Details
Published in:Electrochemical and solid-state letters 2000-01, Vol.3 (1), p.17-19
Main Author: Baarslag, P. C.
Format: Article
Language:English
Online Access:Get full text
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Summary:The etching of the soft magnetic CoNbZr alloy in aqueous HF-free solutions containing H sub 2 O sub 2 was investigated. The influence of solution composition, temperature, and Nb content of the alloy on the etch rate was studied. X-ray photoelectron spectroscopy analyses were performed to examine the surface composition during etching. Patterns with an excellent edge definition were obtained. The etching process was isotropic in nature, but beveled edges could be obtained due to an Nb-poor surface film.
ISSN:1099-0062
DOI:10.1149/1.1390945