Electron production and loss processes in a spectrochemical inductively coupled argon plasma

• Published in: Spectrochimica acta. Part B: Atomic spectroscopy 2003-05, Vol.58 (5), p.783-795
• Main Authors: van de Sande, M.J., van Eck, P., Sola, A., Gamero, A., van der Mullen, J.J.A.M.
• Format: Article
• Language: English
• Subjects: ICP; Molecular argon ions; Power interruption; Thomson scattering
• ISSN: 0584-8547; 1873-3565
• DOI: 10.1016/S0584-8547(03)00004-1

The behavior of inductively coupled plasmas for spectroscopic purposes has been studied extensively in the past. However, many questions about production and loss of electrons, which have a major effect on this behavior, are unanswered. Power interruption is a powerful diagnostic method to study such processes. This paper presents time resolved Thomson scattering measurements of the electron density n e and temperature T e in an inductively coupled argon plasma during and after power interruption. In the center of the plasma the measured temporal development of n e and T e can be attributed to ambipolar diffusion, three-particle recombination and ionization. However, at the edge of the plasma an additional electron loss process must be involved. In addition, the high electron temperature during power interruption indicates the presence of an electron heating mechanism. The energy gain by recombination processes is shown to be insufficient to explain this electron heating. These discrepancies may be explained by the formation and destruction of molecular argon ions, which can be present in significant quantities.