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Lithographic patterning of benzoylacetone modified SnO2 and SnO2:Sb thin films

The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are cryst...

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Bibliographic Details
Published in:Thin solid films 2003-09, Vol.440 (1-2), p.184-189
Main Authors: KOLOLUOMA, Terho, KÄRKKÄINEN, Ari H. O, TOLONEN, Ari, RANTALA, Juha T
Format: Article
Language:English
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Summary:The synthesis of directly UV-photopatternable pure and antimony-doped organo-tin materials is presented. UV-photopatternability has been achieved by using the synthesized benzoylacetone modified tin and antimony 2-isopropoxyethoxides. Photopatterned pure and antimony-doped organo-tin films are crystallized by thermal annealing in order to obtain conductive SnO2 and Sb:SnO2 thin films. The molar ratio between benzoylacetone and metal alkoxides has to be 2 in order to obtain crack-free, good-quality structures. The effects of UV-irradiation, increasing antimony doping level and benzoylacetone concentration on the electrical properties of the single-layered films are analyzed. The highest obtained conductivity was 20 S/cm. Benzoylacetone concentration and UV-irradiation has only a negligible effect on the film electrical conductivities.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(03)00826-5