Dissipative light masks for atomic nanofabrication

We investigate the applicability of laser cooling in intense blue detuned standing light waves for generating nanostructures by direct deposition of atoms on a surface. We report on our results concerning the structure width and modulation depth of the resulting structures, which are important param...

Full description

Saved in:
Bibliographic Details
Published in:Journal of optics. B, Quantum and semiclassical optics Quantum and semiclassical optics, 2003-04, Vol.5 (2), p.S164-S169, Article S164
Main Authors: Stützle, Ralf, Jürgens, Dirk, Habenicht, Anja, Oberthaler, Markus K
Format: Article
Language:English
Subjects:
Atom and neutron optics
Atomic and molecular physics
Atomic properties and interactions with photons
Classical and quantum physics: mechanics and fields
Exact sciences and technology
Matter waves
Optical cooling of atoms
trapping
Photon interactions with atoms
Physics
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c374t-c2bb3310bad053049d412435bbdbc98b641bb62430a3845f8ec549b557537b493
cites cdi_FETCH-LOGICAL-c374t-c2bb3310bad053049d412435bbdbc98b641bb62430a3845f8ec549b557537b493
container_end_page S169
container_issue 2
container_start_page S164
container_title Journal of optics. B, Quantum and semiclassical optics
container_volume 5
creator Stützle, Ralf
Jürgens, Dirk
Habenicht, Anja
Oberthaler, Markus K
description We investigate the applicability of laser cooling in intense blue detuned standing light waves for generating nanostructures by direct deposition of atoms on a surface. We report on our results concerning the structure width and modulation depth of the resulting structures, which are important parameters for future technological applications. As the main result we find that these new masks can lead to a significant reduction of the background. The results were obtained employing a Monte Carlo simulation which was used to check closed formulas for structure width and background. These results allow a straightforward optimization of the performance of masks for specific experimental parameters and atomic species.
doi_str_mv 10.1088/1464-4266/5/2/375
format article
fullrecord <record><control><sourceid>proquest_pasca</sourceid><recordid>TN_cdi_proquest_miscellaneous_27853463</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>27853463</sourcerecordid><originalsourceid>FETCH-LOGICAL-c374t-c2bb3310bad053049d412435bbdbc98b641bb62430a3845f8ec549b557537b493</originalsourceid><addsrcrecordid>eNqNkE9LxDAQxYMouK5-AG-9KB6sTZpM0h5l_QuCFz2HJE012jY16Qp-e1t3RVhEPE2Y_N6bmYfQIcFnBBdFRhhnKcs5zyDLMypgC82IYCSlIGB7fH__76K9GF8wxkBKmKH8wsXoejW4d5s07ul5SFoVX2NS-5CowbfOJJ3qfK10cGbEfLePdmrVRHuwrnP0eHX5sLhJ7-6vbxfnd6mhgg2pybWmlGCtKgwUs7JiJGcUtK60KQvNGdGajx2saMGgLqwBVmoY96VCs5LO0fHKtw_-bWnjIFsXjW0a1Vm_jDIXBVDG6QiSFWiCjzHYWvbBtSp8SILllI6crpfT9RJkLsd0Rs3R2lxFo5o6qM64-CNkAnOAyVtseBs3fMUwBOWaPyecrpTO9_9a6OQXfBOTfVXTT2V6jwI</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27853463</pqid></control><display><type>article</type><title>Dissipative light masks for atomic nanofabrication</title><source>Institute of Physics</source><creator>Stützle, Ralf ; Jürgens, Dirk ; Habenicht, Anja ; Oberthaler, Markus K</creator><creatorcontrib>Stützle, Ralf ; Jürgens, Dirk ; Habenicht, Anja ; Oberthaler, Markus K</creatorcontrib><description>We investigate the applicability of laser cooling in intense blue detuned standing light waves for generating nanostructures by direct deposition of atoms on a surface. We report on our results concerning the structure width and modulation depth of the resulting structures, which are important parameters for future technological applications. As the main result we find that these new masks can lead to a significant reduction of the background. The results were obtained employing a Monte Carlo simulation which was used to check closed formulas for structure width and background. These results allow a straightforward optimization of the performance of masks for specific experimental parameters and atomic species.</description><identifier>ISSN: 1464-4266</identifier><identifier>EISSN: 1741-3575</identifier><identifier>DOI: 10.1088/1464-4266/5/2/375</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Atom and neutron optics ; Atomic and molecular physics ; Atomic properties and interactions with photons ; Classical and quantum physics: mechanics and fields ; Exact sciences and technology ; Matter waves ; Optical cooling of atoms; trapping ; Photon interactions with atoms ; Physics</subject><ispartof>Journal of optics. B, Quantum and semiclassical optics, 2003-04, Vol.5 (2), p.S164-S169, Article S164</ispartof><rights>2003 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c374t-c2bb3310bad053049d412435bbdbc98b641bb62430a3845f8ec549b557537b493</citedby><cites>FETCH-LOGICAL-c374t-c2bb3310bad053049d412435bbdbc98b641bb62430a3845f8ec549b557537b493</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=14706553$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Stützle, Ralf</creatorcontrib><creatorcontrib>Jürgens, Dirk</creatorcontrib><creatorcontrib>Habenicht, Anja</creatorcontrib><creatorcontrib>Oberthaler, Markus K</creatorcontrib><title>Dissipative light masks for atomic nanofabrication</title><title>Journal of optics. B, Quantum and semiclassical optics</title><description>We investigate the applicability of laser cooling in intense blue detuned standing light waves for generating nanostructures by direct deposition of atoms on a surface. We report on our results concerning the structure width and modulation depth of the resulting structures, which are important parameters for future technological applications. As the main result we find that these new masks can lead to a significant reduction of the background. The results were obtained employing a Monte Carlo simulation which was used to check closed formulas for structure width and background. These results allow a straightforward optimization of the performance of masks for specific experimental parameters and atomic species.</description><subject>Atom and neutron optics</subject><subject>Atomic and molecular physics</subject><subject>Atomic properties and interactions with photons</subject><subject>Classical and quantum physics: mechanics and fields</subject><subject>Exact sciences and technology</subject><subject>Matter waves</subject><subject>Optical cooling of atoms; trapping</subject><subject>Photon interactions with atoms</subject><subject>Physics</subject><issn>1464-4266</issn><issn>1741-3575</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNqNkE9LxDAQxYMouK5-AG-9KB6sTZpM0h5l_QuCFz2HJE012jY16Qp-e1t3RVhEPE2Y_N6bmYfQIcFnBBdFRhhnKcs5zyDLMypgC82IYCSlIGB7fH__76K9GF8wxkBKmKH8wsXoejW4d5s07ul5SFoVX2NS-5CowbfOJJ3qfK10cGbEfLePdmrVRHuwrnP0eHX5sLhJ7-6vbxfnd6mhgg2pybWmlGCtKgwUs7JiJGcUtK60KQvNGdGajx2saMGgLqwBVmoY96VCs5LO0fHKtw_-bWnjIFsXjW0a1Vm_jDIXBVDG6QiSFWiCjzHYWvbBtSp8SILllI6crpfT9RJkLsd0Rs3R2lxFo5o6qM64-CNkAnOAyVtseBs3fMUwBOWaPyecrpTO9_9a6OQXfBOTfVXTT2V6jwI</recordid><startdate>20030401</startdate><enddate>20030401</enddate><creator>Stützle, Ralf</creator><creator>Jürgens, Dirk</creator><creator>Habenicht, Anja</creator><creator>Oberthaler, Markus K</creator><general>IOP Publishing</general><general>Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20030401</creationdate><title>Dissipative light masks for atomic nanofabrication</title><author>Stützle, Ralf ; Jürgens, Dirk ; Habenicht, Anja ; Oberthaler, Markus K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c374t-c2bb3310bad053049d412435bbdbc98b641bb62430a3845f8ec549b557537b493</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Atom and neutron optics</topic><topic>Atomic and molecular physics</topic><topic>Atomic properties and interactions with photons</topic><topic>Classical and quantum physics: mechanics and fields</topic><topic>Exact sciences and technology</topic><topic>Matter waves</topic><topic>Optical cooling of atoms; trapping</topic><topic>Photon interactions with atoms</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Stützle, Ralf</creatorcontrib><creatorcontrib>Jürgens, Dirk</creatorcontrib><creatorcontrib>Habenicht, Anja</creatorcontrib><creatorcontrib>Oberthaler, Markus K</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of optics. B, Quantum and semiclassical optics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Stützle, Ralf</au><au>Jürgens, Dirk</au><au>Habenicht, Anja</au><au>Oberthaler, Markus K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Dissipative light masks for atomic nanofabrication</atitle><jtitle>Journal of optics. B, Quantum and semiclassical optics</jtitle><date>2003-04-01</date><risdate>2003</risdate><volume>5</volume><issue>2</issue><spage>S164</spage><epage>S169</epage><pages>S164-S169</pages><artnum>S164</artnum><issn>1464-4266</issn><eissn>1741-3575</eissn><abstract>We investigate the applicability of laser cooling in intense blue detuned standing light waves for generating nanostructures by direct deposition of atoms on a surface. We report on our results concerning the structure width and modulation depth of the resulting structures, which are important parameters for future technological applications. As the main result we find that these new masks can lead to a significant reduction of the background. The results were obtained employing a Monte Carlo simulation which was used to check closed formulas for structure width and background. These results allow a straightforward optimization of the performance of masks for specific experimental parameters and atomic species.</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><doi>10.1088/1464-4266/5/2/375</doi></addata></record>
fulltext fulltext
identifier ISSN: 1464-4266
ispartof Journal of optics. B, Quantum and semiclassical optics, 2003-04, Vol.5 (2), p.S164-S169, Article S164
issn 1464-4266
1741-3575
language eng
recordid cdi_proquest_miscellaneous_27853463
source Institute of Physics
subjects Atom and neutron optics
Atomic and molecular physics
Atomic properties and interactions with photons
Classical and quantum physics: mechanics and fields
Exact sciences and technology
Matter waves
Optical cooling of atoms
trapping
Photon interactions with atoms
Physics
title Dissipative light masks for atomic nanofabrication
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T19%3A24%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Dissipative%20light%20masks%20for%20atomic%20nanofabrication&rft.jtitle=Journal%20of%20optics.%20B,%20Quantum%20and%20semiclassical%20optics&rft.au=St%C3%BCtzle,%20Ralf&rft.date=2003-04-01&rft.volume=5&rft.issue=2&rft.spage=S164&rft.epage=S169&rft.pages=S164-S169&rft.artnum=S164&rft.issn=1464-4266&rft.eissn=1741-3575&rft_id=info:doi/10.1088/1464-4266/5/2/375&rft_dat=%3Cproquest_pasca%3E27853463%3C/proquest_pasca%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c374t-c2bb3310bad053049d412435bbdbc98b641bb62430a3845f8ec549b557537b493%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=27853463&rft_id=info:pmid/&rfr_iscdi=true