Hydrogen Storage Phenomenon in Amorphous Phase of Hydrogenated Carbon Nitride

A H storage characteristic of the amorphous phase of hydrogenated carbon nitride (a-CNx:H) deposited using a gas mixture of CH4 and N2 by a CVD method enhanced by ECR plasma was evaluated under high-pressure H atmosphere. The H content in the sample at 300 K and 77 K was directly measured using a vo...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2003, Vol.42 (Part 1, No. 8), p.5251-5254
Main Authors: Ohkawara, Yoshiaki, Kusaka, Ken-ichi, Ohshio, Shigeo, Higa, Akira, Toguchi, Minoru, Saitoh, Hidetoshi
Format: Article
Language:English
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Summary:A H storage characteristic of the amorphous phase of hydrogenated carbon nitride (a-CNx:H) deposited using a gas mixture of CH4 and N2 by a CVD method enhanced by ECR plasma was evaluated under high-pressure H atmosphere. The H content in the sample at 300 K and 77 K was directly measured using a volumetric analysis established for evaluation of H absorption of metal alloys. The contents of stored H in the sample under 12 MPa were determined to be 1.1 and 2.2 wt.% at 300 and 77 K, resp. The contents of stored H in the sample were larger than those of a-CNx:H deposited from the dissociated reaction of CH3CN and BrCN. The results of the storage behavior of H and ir absorption suggest that the mechanism of H storage might be explained as chemical and physical absorption. 18 refs.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.42.5251