Investigation of the depth range through ultra-thin carbon films on magnetic layers by time-of-flight secondary ion mass spectrometry

This paper presents an examination of the depth range of magnetic layers through ultra-thin carbon films by time-of-flight secondary ion mass spectrometry (TOF-SIMS). X-ray photoelectron spectroscopy (XPS) was used for comparison of TOF-SIMS. The sampling depth of TOF-SIMS is somewhat smaller than t...

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Bibliographic Details
Published in:Applied surface science 2003-01, Vol.203, p.72-77
Main Authors: Tadokoro, N, Yuki, M, Osakabe, K
Format: Article
Language:English
Subjects:
Escape depth
Incidence angle
Magnetic disk
Sampling depth
TOF-SIMS
XPS
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Summary:This paper presents an examination of the depth range of magnetic layers through ultra-thin carbon films by time-of-flight secondary ion mass spectrometry (TOF-SIMS). X-ray photoelectron spectroscopy (XPS) was used for comparison of TOF-SIMS. The sampling depth of TOF-SIMS is somewhat smaller than that of XPS. And also, the sampling depth obtained from this analysis is larger than that of the static SIMS (less than 1 nm) [Surf. Interf. Anal. 10 (1987) 384]. Our results suggest that the sampling depth is related to the sample structure (defects or pinholes of nanometer scale), the sensitivity of analytical tools and the emission process.
ISSN:0169-4332
1873-5584
DOI:10.1016/S0169-4332(02)00681-5