Stoichiometry, morphology and structure of CdS layers grown on InP(1 0 0) from atomic sulfur beam generated from H2S gas and thermally evaporated Cd using molecular beam epitaxy

• Published in: Journal of crystal growth 2003-07, Vol.255 (1-2), p.1-7
• Main Authors: JOO WON CHOI, BHUPATHIRAJU, A, HASAN, M.-A, LANNON, John M
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Molecular, atomic, ion, and chemical beam epitaxy; Physics; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology
• ISSN: 0022-0248; 1873-5002
• DOI: 10.1016/S0022-0248(03)01150-3

Epitaxial growth of cadmium sulfide on InP(100) was carried out using molecular beam epitaxy (MBE). Cd was deposited from an effusion cell while sulfur was supplied from ionized H2S gas using an RF atomic source. Epitaxial growth was achieved at growth temperatures ranging from 150DGC to 300DGC and stoichiometric CdS was obtained at all growth temperatures and fluxes investigated. The CdS layer and CdS/InP interface were investigated using reflection high-energy electron diffraction (RHEED), Auger electron spectroscopy (AES) and atomic force microscopy (AFM). The CdS/InP interface was abrupt with no measurable interdiffusion within the experimental parameters investigated in this work.