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The characteristics of different transparent electrodes on GaN photodetectors

The sputter ITO, TiN and E-gun ITO films deposited onto GaN as the transparent electrodes in the application of metal–semiconductor–metal (MSM) photodetectors were first fabricated and reported. The transmittance of sputter ITO, TiN and E-gun ITO films for thickness of 1000 Å was 94, 62 and 85%, res...

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Published in:Materials chemistry and physics 2003-04, Vol.80 (1), p.201-204
Main Authors: Chiou, Yu-Zung, Chiou, Jung-Ran, Su, Yan-Kuin, Chang, Shoou-Jinn, Huang, Bohr-Ran, Chang, Chia-Sheng, Lin, Yi-Chao
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creator Chiou, Yu-Zung
Chiou, Jung-Ran
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description The sputter ITO, TiN and E-gun ITO films deposited onto GaN as the transparent electrodes in the application of metal–semiconductor–metal (MSM) photodetectors were first fabricated and reported. The transmittance of sputter ITO, TiN and E-gun ITO films for thickness of 1000 Å was 94, 62 and 85%, respectively, at a wavelength of 400 nm. Unlike TiN films, the variation of transmittance of sputter ITO films was not sensitive to the thickness. Also, the effective barrier height of sputter ITO, TiN and E-gun ITO films to GaN was 0.46, 0.59 and 0.95 eV, respectively. Furthermore, the photo/dark contrast of sputter ITO, TiN and E-gun ITO MSM photodetectors was 0.36, 3 and 4.25 orders, at 5 V bias, respectively.
doi_str_mv 10.1016/S0254-0584(02)00483-2
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subjects BST
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Exact sciences and technology
GaN
Iii-v semiconductors
ITO
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Optical properties of specific thin films
Photodetector
Physics
TiN
title The characteristics of different transparent electrodes on GaN photodetectors
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