Heteroatom Doping Promoting CoP for Driving Water Splitting

CoP nanomaterials have been extensively regarded as one of the most promising electrocatalysts for overall water splitting due to their unique bifunctionality. Although the great promise for future applications, some important issues should also be addressed. Heteroatom doping has been widely acknow...

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Bibliographic Details
Published in:Chemical record 2024-01, Vol.24 (1), p.e202300088-n/a
Main Authors: Cheng, Wenjing, Yang, Huimin, Wang, Tingjian, He, Xiaoyan, Tian, Lin, Li, Zhao
Format: Article
Language:English
Subjects:
CoP
Doping
Electrocatalysts
Electronic structure
Heteroatom doping
Industrial applications
Industrial development
Nanomaterials
Nanotechnology
Splitting
Water splitting
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Summary:CoP nanomaterials have been extensively regarded as one of the most promising electrocatalysts for overall water splitting due to their unique bifunctionality. Although the great promise for future applications, some important issues should also be addressed. Heteroatom doping has been widely acknowledged as a potential strategy for improving the electrocatalytic performance of CoP and narrowing the gap between experimental study and industrial applications. Recent years have witnessed the rapid development of heteroatom‐doped CoP electrocatalysts for water splitting. Aiming to provide guidance for the future development of more effective CoP‐based electrocatalysts, we herein organize a comprehensive review of this interesting field, with the special focus on the effects of heteroatom doping on the catalytic performance of CoP. Additionally, many heteroatom‐doped CoP electrocatalysts for water splitting are also discussed, and the structure‐activity relationship is also manifested. Finally, a systematic conclusion and outlook is well organized to provide direction for the future development of this interesting field. A systematic review about the recent progress of heteroatom‐doped CoP catalysts towards electrochemical water splitting is organized.
ISSN:1527-8999
1528-0691
DOI:10.1002/tcr.202300088