Cavitation erosion behavior of nanocrystalline diamond thin films on silicon substrates

In this work, nanocrystalline diamond thin films were synthesized by the hot-filament chemical vapor deposition (HF-CVD) technique on single crystal p-type Si (100) wafers. The reactive gas used was methane (vol. 1 %) in hydrogen. The growth rate of the diamond films was about 0.2 mm/h and their thi...

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Bibliographic Details
Published in:Journal of materials science 2004-11, Vol.39 (21), p.6603-6606
Main Authors: BREGLIOZZI, G, HAENNI, W, HAEFKE, H
Format: Article
Language:English
Subjects:
Cavitation erosion
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Diamond films
Diamonds
Exact sciences and technology
Fullerenes and related materials
diamonds, graphite
Materials science
Mechanical and acoustical properties
Physical properties of thin films, nonelectronic
Physics
Silicon substrates
Specific materials
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin films
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Description
Summary:In this work, nanocrystalline diamond thin films were synthesized by the hot-filament chemical vapor deposition (HF-CVD) technique on single crystal p-type Si (100) wafers. The reactive gas used was methane (vol. 1 %) in hydrogen. The growth rate of the diamond films was about 0.2 mm/h and their thickness was about 1mm.
ISSN:0022-2461
1573-4803
DOI:10.1023/B:JMSC.0000044902.55659.3e