Fabrication of nanostructured Al2CuMg thin film by femtosecond pulsed laser ablation

A nanostructured Al2CuMg thin film was formed by ablating reactive arc melted targets with femtosecond (10-15 s range) laser pulses in a high vacuum chamber (10-6 Torr). The films were characterized by secondary electron microscopy, energy dispersive analysis of X-rays, X-ray diffraction and transmi...

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Bibliographic Details
Published in:Thin solid films 2004-06, Vol.458 (1-2), p.37-42
Main Authors: VASQUEZ, M. Jaime, HALADA, G. P, CLAYTON, C. R, GOUMA, P. I
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Laser deposition
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
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Summary:A nanostructured Al2CuMg thin film was formed by ablating reactive arc melted targets with femtosecond (10-15 s range) laser pulses in a high vacuum chamber (10-6 Torr). The films were characterized by secondary electron microscopy, energy dispersive analysis of X-rays, X-ray diffraction and transmission electron microscopy. Discussion is focused on the morphology of the film produced by this technique. It was observed that the femtosecond ablation technique could be used to form nanostructured metallic thin films.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2003.11.270