Observation of dust particle growth and fallout in RF-excited silane discharges

Particles formed during plasma enhanced chemical vapor deposition of amorphous silicon thin films which fall to the film surface, either during or after the process, may have a severely deleterious effect on film properties. In order to understand the mechanisms of particle formation and fallout we...

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Bibliographic Details
Published in:IEEE transactions on plasma science 1994-04, Vol.22 (2), p.110-115
Main Authors: Bohme, W., Kohler, W.E., Romheld, M., Veprek, S., Seebock, R.J.
Format: Article
Language:English
Subjects:
140501 - Solar Energy Conversion- Photovoltaic Conversion
360601 - Other Materials- Preparation & Manufacture
Amorphous silicon
CHEMICAL COATING
CHEMICAL REACTORS
CHEMICAL VAPOR DEPOSITION
DATA
DEPOSITION
DIRECT ENERGY CONVERTERS
DUSTS
ELECTRIC DISCHARGES
ELEMENTS
EXPERIMENTAL DATA
FABRICATION
GRAIN GROWTH
INFORMATION
MATERIALS SCIENCE
NUMERICAL DATA
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PLASMA
Plasma chemistry
Plasma properties
Radio frequency
Semiconductor films
Semiconductor laser arrays
Semiconductor thin films
SEMIMETALS
SILICON
SILICON SOLAR CELLS
SOLAR CELLS
SOLAR ENERGY
SOLAR EQUIPMENT
Sputtering
SURFACE COATING
Surface discharges
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Summary:Particles formed during plasma enhanced chemical vapor deposition of amorphous silicon thin films which fall to the film surface, either during or after the process, may have a severely deleterious effect on film properties. In order to understand the mechanisms of particle formation and fallout we have investigated the growth and dynamics of particles in RF discharges in pure silane. The diameter of particles formed within the first 20 s of the discharge was investigated by electron microscopy of substrates with fallen out particles. Furthermore we used a He-Ne laser in combination with a diode array camera to measure temporally and spatially resolved light scattering from particles and deduced their sinking speed after switching off the discharge. The results are compared to a theoretical model on the particle dynamics.< >
ISSN:0093-3813
1939-9375
DOI:10.1109/27.279012