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Accurate wavelength spacing from absorption-coupled DFB laser arrays
Six-element absorption-coupled distributed-feedback (DFB) arrays have been fabricated by means of holographic lithography. Using a simple current injection scheme in two-section devices, a standard deviation of 0.11 nm from a uniform wavelength channel spacing of 2 nm has been achieved. This value i...
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Published in: | IEEE photonics technology letters 1997-10, Vol.9 (10), p.1316-1318 |
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container_title | IEEE photonics technology letters |
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creator | Talneau, A. Bouadma, N. Slempkes, S. Ougazzaden, A. Hansmann, S. |
description | Six-element absorption-coupled distributed-feedback (DFB) arrays have been fabricated by means of holographic lithography. Using a simple current injection scheme in two-section devices, a standard deviation of 0.11 nm from a uniform wavelength channel spacing of 2 nm has been achieved. This value is easily obtained using standard lithography technologies for fabrication, and coarse current control for operation. It allows the use of complex-coupled DPB lasers as sources in photonic integrated circuits. |
doi_str_mv | 10.1109/68.623248 |
format | article |
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Using a simple current injection scheme in two-section devices, a standard deviation of 0.11 nm from a uniform wavelength channel spacing of 2 nm has been achieved. This value is easily obtained using standard lithography technologies for fabrication, and coarse current control for operation. 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Using a simple current injection scheme in two-section devices, a standard deviation of 0.11 nm from a uniform wavelength channel spacing of 2 nm has been achieved. This value is easily obtained using standard lithography technologies for fabrication, and coarse current control for operation. It allows the use of complex-coupled DPB lasers as sources in photonic integrated circuits.</description><subject>Distributed feedback devices</subject><subject>Etching</subject><subject>Gratings</subject><subject>Holography</subject><subject>Indium phosphide</subject><subject>Lithography</subject><subject>Optical arrays</subject><subject>Resists</subject><subject>Semiconductor laser arrays</subject><subject>Surface emitting lasers</subject><issn>1041-1135</issn><issn>1941-0174</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNo90DFPwzAQBWALgUQpDKxMnpAYUnKx48RjaSkgVWKB2brYlxKUJsFOQP33BKViuifdpzc8xq4hXgDE-l7lC5WIROYnbAZaQhRDJk_HHI8ZQKTn7CKEzzgGmQo5Y-ultYPHnvgPflNNza7_4KFDWzU7Xvp2z7EIre_6qm0i2w5dTY6vNw-8xkCeo_d4CJfsrMQ60NXxztn75vFt9RxtX59eVsttZJMs6yORoxYpaaGV065AwkSDFIWlROWyVJpSkTrlSuEKB0hZMUJRSMpAONQg5ux26u18-zVQ6M2-CpbqGhtqh2CSHLQWUo3wboLWtyF4Kk3nqz36g4HY_O1kVG6mnUZ7M9mKiP7d8fkLFkFjDw</recordid><startdate>199710</startdate><enddate>199710</enddate><creator>Talneau, A.</creator><creator>Bouadma, N.</creator><creator>Slempkes, S.</creator><creator>Ougazzaden, A.</creator><creator>Hansmann, S.</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>199710</creationdate><title>Accurate wavelength spacing from absorption-coupled DFB laser arrays</title><author>Talneau, A. ; Bouadma, N. ; Slempkes, S. ; Ougazzaden, A. ; Hansmann, S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c277t-38a935e9396d9dbaea29143bce2684f69e535d6df3dbd1ae7b96d3b4e713da913</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Distributed feedback devices</topic><topic>Etching</topic><topic>Gratings</topic><topic>Holography</topic><topic>Indium phosphide</topic><topic>Lithography</topic><topic>Optical arrays</topic><topic>Resists</topic><topic>Semiconductor laser arrays</topic><topic>Surface emitting lasers</topic><toplevel>online_resources</toplevel><creatorcontrib>Talneau, A.</creatorcontrib><creatorcontrib>Bouadma, N.</creatorcontrib><creatorcontrib>Slempkes, S.</creatorcontrib><creatorcontrib>Ougazzaden, A.</creatorcontrib><creatorcontrib>Hansmann, S.</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE photonics technology letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Talneau, A.</au><au>Bouadma, N.</au><au>Slempkes, S.</au><au>Ougazzaden, A.</au><au>Hansmann, S.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Accurate wavelength spacing from absorption-coupled DFB laser arrays</atitle><jtitle>IEEE photonics technology letters</jtitle><stitle>LPT</stitle><date>1997-10</date><risdate>1997</risdate><volume>9</volume><issue>10</issue><spage>1316</spage><epage>1318</epage><pages>1316-1318</pages><issn>1041-1135</issn><eissn>1941-0174</eissn><coden>IPTLEL</coden><abstract>Six-element absorption-coupled distributed-feedback (DFB) arrays have been fabricated by means of holographic lithography. Using a simple current injection scheme in two-section devices, a standard deviation of 0.11 nm from a uniform wavelength channel spacing of 2 nm has been achieved. This value is easily obtained using standard lithography technologies for fabrication, and coarse current control for operation. It allows the use of complex-coupled DPB lasers as sources in photonic integrated circuits.</abstract><pub>IEEE</pub><doi>10.1109/68.623248</doi><tpages>3</tpages></addata></record> |
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source | IEEE Xplore (Online service) |
subjects | Distributed feedback devices Etching Gratings Holography Indium phosphide Lithography Optical arrays Resists Semiconductor laser arrays Surface emitting lasers |
title | Accurate wavelength spacing from absorption-coupled DFB laser arrays |
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