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Kinetic and strain-driven growth phenomena on Si(001)
Self‐organization phenomena in semiconductors are usually based on strain‐driven island growth during hetero epitaxial layer deposition. However, kinetic phenomena can become important and even dominating at the low growth temperatures usually employed during molecular beam epitaxy. We report on kin...
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Published in: | Physica status solidi. A, Applied research Applied research, 2004-01, Vol.201 (2), p.324-328 |
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container_title | Physica status solidi. A, Applied research |
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creator | Schelling, C. Myslivecek, J. Mühlberger, M. Lichtenberger, H. Zhong, Z. Voigtländer, B. Bauer, G. Schäffler, F. |
description | Self‐organization phenomena in semiconductors are usually based on strain‐driven island growth during hetero epitaxial layer deposition. However, kinetic phenomena can become important and even dominating at the low growth temperatures usually employed during molecular beam epitaxy. We report on kinetic step bunching on Si(001), and identify the driving mechanism on the atomic scale via kinetic Monte Carlo simulations. Another phenomena discussed is facet formation during annealing of SiO2‐covered Si(001) nanostructures at the relatively low temperatures usually employed for oxide desorption. Both phenomena are combined to facilitate perfect ordering of self‐assembled Ge dots on facetted Si(001) nanostructure templates. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
doi_str_mv | 10.1002/pssa.200303966 |
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subjects | 68.35.−p 68.55.AC 68.65.Hb 81.15.Hi Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Theory and models of film growth |
title | Kinetic and strain-driven growth phenomena on Si(001) |
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