Large-Area Three-Dimensional Structuring by Electrochemical Etching and Lithography

The fabrication of three‐dimensional silicon networks (see Figure) via a self‐stabilized electrochemical etching technique onto lithographically pre‐structured substrates is demonstrated. The optical characterization confirms a complete three‐dimensional photonic bandgap of about 4 % centered at 3 μ...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2004-12, Vol.16 (23-24), p.2166-2170
Main Authors: Matthias, S., Müller, F., Jamois, C., Wehrspohn, R. B., Gösele, U.
Format: Article
Language:English
Subjects:
Electrochemical etching
Etching
Macroporous materials
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Summary:The fabrication of three‐dimensional silicon networks (see Figure) via a self‐stabilized electrochemical etching technique onto lithographically pre‐structured substrates is demonstrated. The optical characterization confirms a complete three‐dimensional photonic bandgap of about 4 % centered at 3 μm.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200400436