Molybdenum–carbon film fabricated using metal cathodic arc and acetylene dual plasma deposition

Metal cathodic arc and acetylene dual plasma deposition is used to synthesize molybdenum-containing diamond-like carbon (Mo-DLC) thin films. The Mo contents in the film layer can be controlled by varying the acetylene gas flow rates and the substrate bias voltages. The Mo-doped film prepared by the...

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Bibliographic Details
Published in:Surface & coatings technology 2004-08, Vol.186 (1), p.112-117
Main Authors: Fu, Ricky K.Y, Mei, Y.F, Shen, L.R, Siu, G.G, Chu, Paul K, Cheung, W.Y, Wong, S.P
Format: Article
Language:English
Subjects:
Diamond-like carbon films (DLC)
Dual plasma deposition
Metal-doped DLC
Nanocrystalline carbides
Thermal stability
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Summary:Metal cathodic arc and acetylene dual plasma deposition is used to synthesize molybdenum-containing diamond-like carbon (Mo-DLC) thin films. The Mo contents in the film layer can be controlled by varying the acetylene gas flow rates and the substrate bias voltages. The Mo-doped film prepared by the above technique exhibits small surface roughness. Fine molybdenum carbide grains are found to be embedded inside the amorphous carbon cross-linked structures. In addition, these films are shown to possess high thermal stability after a series of high temperature annealing. The results show that dual plasma deposition is a useful and effective technique to fabricate metal-incorporated carbon thin films with controlled metal contents.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2004.04.024