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Fabrication and accelerated hermeticity testing of an on-wafer package for RF MEMS
A hermetic silicon micromachined on-wafer dc-to-40-GHz packaging scheme for RF microelectromechanical systems (MEMS) switches is presented. The designed on-wafer package has a deembedded insertion loss of 0.03 dB per transition up to 40 GHz (a total measured loss of 0.3 dB including a 2.7-mm-long th...
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Published in: | IEEE transactions on microwave theory and techniques 2004-06, Vol.52 (6), p.1626-1636 |
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container_title | IEEE transactions on microwave theory and techniques |
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creator | Margomenos, A. Katehi, L.P.B. |
description | A hermetic silicon micromachined on-wafer dc-to-40-GHz packaging scheme for RF microelectromechanical systems (MEMS) switches is presented. The designed on-wafer package has a deembedded insertion loss of 0.03 dB per transition up to 40 GHz (a total measured loss of 0.3 dB including a 2.7-mm-long through line) and a return loss below -18dB up to 40 GHz. The hermeticity of the packaged is tested using an autoclave chamber with accelerated conditions of 130/spl deg/C, 2.7 atm of pressure, and 100% relative humidity. The fabrication process is designed so as to be completely compatible with the MEMS switch process, hence, allowing the parallel fabrication of all the components on a single wafer. The on-wafer proposed packaging approach requires no external wiring to achieve signal propagation and, thus, it has the potential for lower loss and better performance at higher frequencies. |
doi_str_mv | 10.1109/TMTT.2004.828467 |
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The designed on-wafer package has a deembedded insertion loss of 0.03 dB per transition up to 40 GHz (a total measured loss of 0.3 dB including a 2.7-mm-long through line) and a return loss below -18dB up to 40 GHz. The hermeticity of the packaged is tested using an autoclave chamber with accelerated conditions of 130/spl deg/C, 2.7 atm of pressure, and 100% relative humidity. The fabrication process is designed so as to be completely compatible with the MEMS switch process, hence, allowing the parallel fabrication of all the components on a single wafer. The on-wafer proposed packaging approach requires no external wiring to achieve signal propagation and, thus, it has the potential for lower loss and better performance at higher frequencies.</description><identifier>ISSN: 0018-9480</identifier><identifier>EISSN: 1557-9670</identifier><identifier>DOI: 10.1109/TMTT.2004.828467</identifier><identifier>CODEN: IETMAB</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Fabrication ; Insertion loss ; Life estimation ; Loss measurement ; Micromechanical devices ; Packaging ; Radiofrequency microelectromechanical systems ; Silicon ; Switches ; Testing</subject><ispartof>IEEE transactions on microwave theory and techniques, 2004-06, Vol.52 (6), p.1626-1636</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. 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The designed on-wafer package has a deembedded insertion loss of 0.03 dB per transition up to 40 GHz (a total measured loss of 0.3 dB including a 2.7-mm-long through line) and a return loss below -18dB up to 40 GHz. The hermeticity of the packaged is tested using an autoclave chamber with accelerated conditions of 130/spl deg/C, 2.7 atm of pressure, and 100% relative humidity. The fabrication process is designed so as to be completely compatible with the MEMS switch process, hence, allowing the parallel fabrication of all the components on a single wafer. The on-wafer proposed packaging approach requires no external wiring to achieve signal propagation and, thus, it has the potential for lower loss and better performance at higher frequencies.</description><subject>Fabrication</subject><subject>Insertion loss</subject><subject>Life estimation</subject><subject>Loss measurement</subject><subject>Micromechanical devices</subject><subject>Packaging</subject><subject>Radiofrequency microelectromechanical systems</subject><subject>Silicon</subject><subject>Switches</subject><subject>Testing</subject><issn>0018-9480</issn><issn>1557-9670</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNpdkE1Lw0AQhhdRsFbvgpfFg7fUmXzsx1FKq4JFqPG8bDazNbVN6iZF-u9NiSB4GoZ53uHlYewaYYII-j5f5PkkBkgnKlapkCdshFkmIy0knLIRAKpIpwrO2UXbrvs1zUCN2HJui1A521VNzW1dcuscbSjYjkr-QWFLXeWq7sA7aruqXvHG9xhv6ujbegp8Z92nXRH3TeDLOV_MFm-X7MzbTUtXv3PM3uezfPoUvbw-Pk8fXiKXqKyLShQeNWEqS1cWKAQAaG91XGCGKaY-UTKGDJ1KZCGstFlJmU-EdiS09piM2d3wdxear31fz2yrti-_sTU1-9bEKpYyEUfw9h-4bvah7rsZpVIEIRB6CAbIhaZtA3mzC9XWhoNBMEfD5mjYHA2bwXAfuRkiFRH94QnESX_9AWZPdZw</recordid><startdate>200406</startdate><enddate>200406</enddate><creator>Margomenos, A.</creator><creator>Katehi, L.P.B.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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The designed on-wafer package has a deembedded insertion loss of 0.03 dB per transition up to 40 GHz (a total measured loss of 0.3 dB including a 2.7-mm-long through line) and a return loss below -18dB up to 40 GHz. The hermeticity of the packaged is tested using an autoclave chamber with accelerated conditions of 130/spl deg/C, 2.7 atm of pressure, and 100% relative humidity. The fabrication process is designed so as to be completely compatible with the MEMS switch process, hence, allowing the parallel fabrication of all the components on a single wafer. The on-wafer proposed packaging approach requires no external wiring to achieve signal propagation and, thus, it has the potential for lower loss and better performance at higher frequencies.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TMTT.2004.828467</doi><tpages>11</tpages></addata></record> |
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subjects | Fabrication Insertion loss Life estimation Loss measurement Micromechanical devices Packaging Radiofrequency microelectromechanical systems Silicon Switches Testing |
title | Fabrication and accelerated hermeticity testing of an on-wafer package for RF MEMS |
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