Plasma hydrogenation of Al, Mg and MgAl films under high-flux ion irradiation at elevated temperature

The behaviors of hydrogen in Al, Mg and MgAl thin films on stainless steel substrate were investigated in this work. The hydrogen ions extracted from plasma were used to load hydrogen into the film material. Glow discharge optical emission spectroscopy (GDOES) was applied to obtain the hydrogen dept...

Full description

Saved in:
Bibliographic Details
Published in:Journal of alloys and compounds 2004-06, Vol.373 (1), p.9-15
Main Authors: Pranevicius, L, Milcius, D, Pranevicius, L.L, Thomas, G
Format: Article
Language:English
Subjects:
Applied sciences
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Hydrogen storage material
Materials science
Metals. Metallurgy
Physics
Surface treatments
Thin films
Vapour deposition
X-ray diffraction
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The behaviors of hydrogen in Al, Mg and MgAl thin films on stainless steel substrate were investigated in this work. The hydrogen ions extracted from plasma were used to load hydrogen into the film material. Glow discharge optical emission spectroscopy (GDOES) was applied to obtain the hydrogen depth profiles in Al films versus hydriding parameters. The MgH 2, AlH 3 and Mg(AlH 4) 2 hydrides were identified in plasma hydrided films using X-ray diffraction (XRD). The results provide new aspects of hydriding of thin films under highly non-equilibrium conditions on the surface supported by high-flux ion irradiation.
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2003.10.029