Gun energy filter for a low energy electron microscope

•A gun energy filter was designed and added to an aberration corrected low energy electron microscope.•Energy resolution of 100 meV was achieved, in good agreement with expectations.•Improved energy resolution was observed and measured with the Mirror-To-LEEM transition. In a Low Energy Electron Mic...

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Bibliographic Details
Published in:Ultramicroscopy 2023-11, Vol.253, p.113798-113798, Article 113798
Main Authors: Tromp, Rudolf M., Hannon, James B., Dyck, Meredith L.
Format: Article
Language:English
Subjects:
Energy resolution
Gun energy filter
Low energy electron microscopy
Mirror electron microscopy
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Summary:•A gun energy filter was designed and added to an aberration corrected low energy electron microscope.•Energy resolution of 100 meV was achieved, in good agreement with expectations.•Improved energy resolution was observed and measured with the Mirror-To-LEEM transition. In a Low Energy Electron Microscope (LEEM) the sample is illuminated with an electron beam with typical electron landing energies from 0–100 eV. The energy spread of the electron beam is determined by the characteristics of the electron source. For the two most commonly used electron sources, LaB6 and cold field emission W, typical energy spreads ΔE are 0.75 and 0.25 eV at full width half maximum, respectively. Here we present a design for a LEEM gun energy filter, that reduces ΔE to ∼100 meV. Such a filter has been incorporated in the IBM/SPECS AC-LEEM system at IBM. Experimental results are presented and found to be in excellent agreement with expectations.
ISSN:0304-3991
1879-2723
DOI:10.1016/j.ultramic.2023.113798