Growth of large area YBa(2)Cu(3)O(7-x) thin film by cylindrical hollow cathode sputtering

We have deposited large area YBa(2)Cu(3)O(7-x) thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. X-ray diffraction analysis and scanning ele...

Full description

Saved in:
Bibliographic Details
Published in:IEEE transactions on applied superconductivity 2001-03, Vol.11 (1), p.3844-3847
Main Authors: Suh, Jeong-Dae, Han, Seok Kil, Kang, Kwang Yong, Kwak, Min Hwan
Format: Article
Language:English
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We have deposited large area YBa(2)Cu(3)O(7-x) thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. X-ray diffraction analysis and scanning electron micrographs showed that the films are completely c-axis oriented. The variation of the thickness was less than 5% over the whole substrate. The values of microwave surface resistance were 1 mOmicron at 25 K and 40 mOmicron at 77 K and 19.6 GHz
ISSN:1051-8223
DOI:10.1109/77.919903