Highly Porous Nanocluster Ti02 Films Deposited Using APCVD in an Excess of Water Vapor

This paper describes high-porosity titanium dioxide (TiO2) films deposited via atmospheric pressure chemical vapor deposition using tetraisopropyl titanate at deposition temperatures (Tdep) of 250 and 450DGC in excess water vapor. Films deposited at low Tdep exhibit a very low refractive index (nfil...

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2005-01, Vol.152 (7), p.F71-F74
Main Authors: Richards, B S, Huong, N T P, Crosky, A
Format: Article
Language:English
Online Access:Get full text
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Summary:This paper describes high-porosity titanium dioxide (TiO2) films deposited via atmospheric pressure chemical vapor deposition using tetraisopropyl titanate at deposition temperatures (Tdep) of 250 and 450DGC in excess water vapor. Films deposited at low Tdep exhibit a very low refractive index (nfilm) and high porosity (phi), up to 87% of the bulk rutile phase. High-temperature sintering, performed at either 450 or 1000DGC, can be used to tailor the films properties by crystallizing the nanoclusters into the anatase or rutile phase, while retaining a low nfilm and high phi. The nanoporous nature of the films has significantly retarded the transformation from anatase to rutile, and after sintering for 6 h at 1000DGC, the anatase fraction is still greater than 79%. Such TiO2 thin films with a high surface area to volume ratio are suitable for use in dye-sensitized solar cells and gas sensors.
ISSN:0013-4651
DOI:10.1149/1.1921687