A silicon integrated opto-electro-mechanical displacement sensor

This paper describes a compact and low cost micro-opto-electro-mechanical displacement sensor. Our purpose is the fabrication of a long range, nanometer resolved encoder using a standard CMOS technology, in order to integrate the optical metrology system (photodiodes, analog and digital circuits) on...

Full description

Saved in:
Bibliographic Details
Published in:Sensors and actuators. A. Physical. 2004-02, Vol.110 (1), p.294-300
Main Authors: Fourment, S., Arguel, P., Noullet, J.-L., Lozes, F., Bonnefont, S., Sarrabayrouse, G., Jourlin, Y., Jay, J., Parriaux, O.
Format: Article
Language:English
Subjects:
Diffraction gratings
Displacement sensors
optoASICs
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:This paper describes a compact and low cost micro-opto-electro-mechanical displacement sensor. Our purpose is the fabrication of a long range, nanometer resolved encoder using a standard CMOS technology, in order to integrate the optical metrology system (photodiodes, analog and digital circuits) on a single chip. We introduce the interferometric linear encoder principle using diffraction gratings; then we present results of optical and electrical characterization of an optoASIC including photodiodes and associated electronic integrated on a standard 0.6 μm CMOS process. This CMOS circuitry is then included inside of a prototype of linear displacement encoder using the principle of diffraction gratings in reflection. Finally, we present the fabrication of micrometer and sub-micrometer diffraction gratings etched in silicon material, in order to obtain a higher encoder integration.
ISSN:0924-4247
1873-3069
DOI:10.1016/j.sna.2003.10.067