Magnetic properties of nanostructure controlled FeAlSi/FeAlSiO multilayers

FeAlSi/FeAlSiO multilayers prepared by the pulse reactive sputtering were investigated. It was found that the layered structure had a high thermal stability over the ordering temperature of FeAlSi. In consequence, a saturation magnetic flux density of 1.4-1.5 T, a high isotropic initial permeability...

Full description

Saved in:
Bibliographic Details
Published in:IEEE transactions on magnetics 1994-11, Vol.30 (6), p.4884-4886
Main Authors: Hiramoto, M., Inoue, O., Kugimiya, K.
Format: Article
Language:English
Subjects:
Annealing
Diffraction
Magnetic films
Magnetic multilayers
Magnetic properties
Nonhomogeneous media
Plasma measurements
Soft magnetic materials
Sputtering
Thermal stability
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c343t-1b22a0900f2326b3ce53f77ca0225eb518a044f7a519295246c53021dd564743
cites cdi_FETCH-LOGICAL-c343t-1b22a0900f2326b3ce53f77ca0225eb518a044f7a519295246c53021dd564743
container_end_page 4886
container_issue 6
container_start_page 4884
container_title IEEE transactions on magnetics
container_volume 30
creator Hiramoto, M.
Inoue, O.
Kugimiya, K.
description FeAlSi/FeAlSiO multilayers prepared by the pulse reactive sputtering were investigated. It was found that the layered structure had a high thermal stability over the ordering temperature of FeAlSi. In consequence, a saturation magnetic flux density of 1.4-1.5 T, a high isotropic initial permeability of 2000-10000 at 1 MHz were obtained even after the thermal annealing above 500/spl deg/C.< >
doi_str_mv 10.1109/20.334254
format article
fullrecord <record><control><sourceid>proquest_ieee_</sourceid><recordid>TN_cdi_proquest_miscellaneous_28374340</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>334254</ieee_id><sourcerecordid>28374340</sourcerecordid><originalsourceid>FETCH-LOGICAL-c343t-1b22a0900f2326b3ce53f77ca0225eb518a044f7a519295246c53021dd564743</originalsourceid><addsrcrecordid>eNo90D1PwzAQBmALgUQpDKxMmZAY0p6_knqsKsqHijrQ3XLcCzJy42I7Q_89QamYXp3u0en0EnJPYUYpqDmDGeeCSXFBJlQJWgJU6pJMAOiiVKIS1-Qmpe9hFJLChLx_mK8Os7PFMYYjxuwwFaEtOtOFlGNvcx-xsKHLMXiP-2KNS__p5mNsi0Pvs_PmhDHdkqvW-IR355yS3fp5t3otN9uXt9VyU1oueC5pw5gBBdAyzqqGW5S8rWtrgDGJjaQLA0K0tZFUMSWZqKzkwOh-LytRCz4lj-PZ4eGfHlPWB5csem86DH3SbMEHJWCATyO0MaQUsdXH6A4mnjQF_VeWZqDHsgb7MFqHiP_uvPwFtSNjOw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28374340</pqid></control><display><type>article</type><title>Magnetic properties of nanostructure controlled FeAlSi/FeAlSiO multilayers</title><source>IEEE Xplore (Online service)</source><creator>Hiramoto, M. ; Inoue, O. ; Kugimiya, K.</creator><creatorcontrib>Hiramoto, M. ; Inoue, O. ; Kugimiya, K.</creatorcontrib><description>FeAlSi/FeAlSiO multilayers prepared by the pulse reactive sputtering were investigated. It was found that the layered structure had a high thermal stability over the ordering temperature of FeAlSi. In consequence, a saturation magnetic flux density of 1.4-1.5 T, a high isotropic initial permeability of 2000-10000 at 1 MHz were obtained even after the thermal annealing above 500/spl deg/C.&lt; &gt;</description><identifier>ISSN: 0018-9464</identifier><identifier>EISSN: 1941-0069</identifier><identifier>DOI: 10.1109/20.334254</identifier><identifier>CODEN: IEMGAQ</identifier><language>eng</language><publisher>IEEE</publisher><subject>Annealing ; Diffraction ; Magnetic films ; Magnetic multilayers ; Magnetic properties ; Nonhomogeneous media ; Plasma measurements ; Soft magnetic materials ; Sputtering ; Thermal stability</subject><ispartof>IEEE transactions on magnetics, 1994-11, Vol.30 (6), p.4884-4886</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c343t-1b22a0900f2326b3ce53f77ca0225eb518a044f7a519295246c53021dd564743</citedby><cites>FETCH-LOGICAL-c343t-1b22a0900f2326b3ce53f77ca0225eb518a044f7a519295246c53021dd564743</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/334254$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids></links><search><creatorcontrib>Hiramoto, M.</creatorcontrib><creatorcontrib>Inoue, O.</creatorcontrib><creatorcontrib>Kugimiya, K.</creatorcontrib><title>Magnetic properties of nanostructure controlled FeAlSi/FeAlSiO multilayers</title><title>IEEE transactions on magnetics</title><addtitle>TMAG</addtitle><description>FeAlSi/FeAlSiO multilayers prepared by the pulse reactive sputtering were investigated. It was found that the layered structure had a high thermal stability over the ordering temperature of FeAlSi. In consequence, a saturation magnetic flux density of 1.4-1.5 T, a high isotropic initial permeability of 2000-10000 at 1 MHz were obtained even after the thermal annealing above 500/spl deg/C.&lt; &gt;</description><subject>Annealing</subject><subject>Diffraction</subject><subject>Magnetic films</subject><subject>Magnetic multilayers</subject><subject>Magnetic properties</subject><subject>Nonhomogeneous media</subject><subject>Plasma measurements</subject><subject>Soft magnetic materials</subject><subject>Sputtering</subject><subject>Thermal stability</subject><issn>0018-9464</issn><issn>1941-0069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNo90D1PwzAQBmALgUQpDKxMmZAY0p6_knqsKsqHijrQ3XLcCzJy42I7Q_89QamYXp3u0en0EnJPYUYpqDmDGeeCSXFBJlQJWgJU6pJMAOiiVKIS1-Qmpe9hFJLChLx_mK8Os7PFMYYjxuwwFaEtOtOFlGNvcx-xsKHLMXiP-2KNS__p5mNsi0Pvs_PmhDHdkqvW-IR355yS3fp5t3otN9uXt9VyU1oueC5pw5gBBdAyzqqGW5S8rWtrgDGJjaQLA0K0tZFUMSWZqKzkwOh-LytRCz4lj-PZ4eGfHlPWB5csem86DH3SbMEHJWCATyO0MaQUsdXH6A4mnjQF_VeWZqDHsgb7MFqHiP_uvPwFtSNjOw</recordid><startdate>19941101</startdate><enddate>19941101</enddate><creator>Hiramoto, M.</creator><creator>Inoue, O.</creator><creator>Kugimiya, K.</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19941101</creationdate><title>Magnetic properties of nanostructure controlled FeAlSi/FeAlSiO multilayers</title><author>Hiramoto, M. ; Inoue, O. ; Kugimiya, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c343t-1b22a0900f2326b3ce53f77ca0225eb518a044f7a519295246c53021dd564743</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1994</creationdate><topic>Annealing</topic><topic>Diffraction</topic><topic>Magnetic films</topic><topic>Magnetic multilayers</topic><topic>Magnetic properties</topic><topic>Nonhomogeneous media</topic><topic>Plasma measurements</topic><topic>Soft magnetic materials</topic><topic>Sputtering</topic><topic>Thermal stability</topic><toplevel>online_resources</toplevel><creatorcontrib>Hiramoto, M.</creatorcontrib><creatorcontrib>Inoue, O.</creatorcontrib><creatorcontrib>Kugimiya, K.</creatorcontrib><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on magnetics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hiramoto, M.</au><au>Inoue, O.</au><au>Kugimiya, K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Magnetic properties of nanostructure controlled FeAlSi/FeAlSiO multilayers</atitle><jtitle>IEEE transactions on magnetics</jtitle><stitle>TMAG</stitle><date>1994-11-01</date><risdate>1994</risdate><volume>30</volume><issue>6</issue><spage>4884</spage><epage>4886</epage><pages>4884-4886</pages><issn>0018-9464</issn><eissn>1941-0069</eissn><coden>IEMGAQ</coden><abstract>FeAlSi/FeAlSiO multilayers prepared by the pulse reactive sputtering were investigated. It was found that the layered structure had a high thermal stability over the ordering temperature of FeAlSi. In consequence, a saturation magnetic flux density of 1.4-1.5 T, a high isotropic initial permeability of 2000-10000 at 1 MHz were obtained even after the thermal annealing above 500/spl deg/C.&lt; &gt;</abstract><pub>IEEE</pub><doi>10.1109/20.334254</doi><tpages>3</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0018-9464
ispartof IEEE transactions on magnetics, 1994-11, Vol.30 (6), p.4884-4886
issn 0018-9464
1941-0069
language eng
recordid cdi_proquest_miscellaneous_28374340
source IEEE Xplore (Online service)
subjects Annealing
Diffraction
Magnetic films
Magnetic multilayers
Magnetic properties
Nonhomogeneous media
Plasma measurements
Soft magnetic materials
Sputtering
Thermal stability
title Magnetic properties of nanostructure controlled FeAlSi/FeAlSiO multilayers
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-02T03%3A32%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_ieee_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Magnetic%20properties%20of%20nanostructure%20controlled%20FeAlSi/FeAlSiO%20multilayers&rft.jtitle=IEEE%20transactions%20on%20magnetics&rft.au=Hiramoto,%20M.&rft.date=1994-11-01&rft.volume=30&rft.issue=6&rft.spage=4884&rft.epage=4886&rft.pages=4884-4886&rft.issn=0018-9464&rft.eissn=1941-0069&rft.coden=IEMGAQ&rft_id=info:doi/10.1109/20.334254&rft_dat=%3Cproquest_ieee_%3E28374340%3C/proquest_ieee_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c343t-1b22a0900f2326b3ce53f77ca0225eb518a044f7a519295246c53021dd564743%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=28374340&rft_id=info:pmid/&rft_ieee_id=334254&rfr_iscdi=true