Imprinting Well-Controlled Nanopores in Organosilicate Dielectric Films: Triethoxysilyl-Modified Six-Armed Poly(ϵ-caprolactone) and Its Chemical Hybridization with an Organosilicate Precursor

A triethoxysilyl‐terminated, six‐armed poly(ϵ‐caprolactone) porogen is synthesized and the terminal groups are found to significantly reduce the aggregation of the porogen molecules in an organosilicate precursor via their hybridization reaction with the precursor. The porogen molecules successfully...

Full description

Saved in:
Bibliographic Details
Published in:Advanced materials (Weinheim) 2005-03, Vol.17 (6), p.696-701
Main Authors: Lee, B., Oh, W., Hwang, Y., Park, Y.-H., Yoon, J., Jin, K. S., Heo, K., Kim, J., Kim, K.-W., Ree, M.
Format: Article
Language:English
Subjects:
Nanoporous materials
Porogens
Thin films
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A triethoxysilyl‐terminated, six‐armed poly(ϵ‐caprolactone) porogen is synthesized and the terminal groups are found to significantly reduce the aggregation of the porogen molecules in an organosilicate precursor via their hybridization reaction with the precursor. The porogen molecules successfully imprint nanopores in the organosilicate dielectric thin film (see Figure) through their sacrificial thermal decomposition.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200400919