Atomic force microscopy-based nano-lithography for nano-patterning: a molecular dynamic study

The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were perfo...

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Bibliographic Details
Published in:Journal of materials processing technology 2004-11, Vol.155-156, p.1847-1854
Main Authors: Kim, Y.S., Na, K.H., Choi, S.O., Yang, S.H.
Format: Article
Language:English
Subjects:
AFM
MEMS
Molecular dynamics simulation
Nano-lithography
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Summary:The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nano-deformation characteristics of the nano-lithography process of monocrystalline copper. Moreover, the effects of process variables (the tool shape, cutting speed and undeformed chip thickness) on the nano-structural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force) as well as the nature of the nano-deformation ahead of the tool and surface quality of the machined material.
ISSN:0924-0136
DOI:10.1016/j.jmatprotec.2004.04.377