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Cationic β-Scission of C-H and C--C Bonds for Selective Dimerization and Subsequent Sulfur-Free RAFT Polymerization of α-Methylstyrene and Isobutylene

A series of exo-olefin compounds ((CH3)2C(PhY)-CH2C(=CH2)PhY) were prepared by selective cationic dimerization of α-methylstyrene (αMS) derivatives (CH2=C(CH3)PhY) with p-toluenesulfonic acid (TsOH) via β-C-H scision. They were subsequently used as reversible chain transfer agents for sulfur-free ca...

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Published in:Angewandte Chemie International Edition 2023-10, Vol.62 (43), p.e202307791-e202307791
Main Authors: Tanimoto, Takayuki, Uchiyama, Mineto, Kamigaito, Masami
Format: Article
Language:English
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Summary:A series of exo-olefin compounds ((CH3)2C(PhY)-CH2C(=CH2)PhY) were prepared by selective cationic dimerization of α-methylstyrene (αMS) derivatives (CH2=C(CH3)PhY) with p-toluenesulfonic acid (TsOH) via β-C-H scision. They were subsequently used as reversible chain transfer agents for sulfur-free cationic RAFT polymerization of αMS via β-C-C scission in the presence of Lewis acid catalysts such as SnCl4. In particular, exo-olefin compounds with electron-donating substituents, such as a 4-MeO group (Y) on the aromatic ring, worked as efficient cationic RAFT agents for αMS to produce poly(αMS) with controlled molecular weights and exo-olefin terminals. Other exo-olefin compounds (R-CH2C(=CH2)(4-MeOPh)) with various R groups were prepared by different methods to examine the effects of R groups on the cationic RAFT polymerization. A sulfur-free cationic RAFT polymerization also proceeded for isobutylene (IB) with the exo-olefin αMS dimer ((CH3)2C(Ph)-CH2C(=CH2)Ph). Furthermore, telechelic poly(IB) with exo-olefins at both terminals was obtained with a bifunctional RAFT agent containing two exo-olefins. Finally, block copolymers of αMS and MMA were prepared via mechanistic transformation from cationic to radical RAFT polymerization using exo-olefin terminals containing 4-MeOPh groups as common sulfur-free RAFT groups for both cationic and radical polymerizations.
ISSN:1433-7851
1521-3773
DOI:10.1002/anie.202307791