Computations of local electric field and electric forces acting on carbon nanotubes in a direct current plasma sheath

• Published in: Thin solid films 2005-10, Vol.489 (1), p.291-295
• Main Authors: Blaek, J., Špatenka, P., Pácal, F., Täschner, Ch, Leonhardt, A.
• Format: Article
• Language: English
• Subjects: Carbon nanotubes; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Electrical properties and measurements; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; Exact sciences and technology; Physics; Plasma processing and deposition; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2005.04.084

The direct current bias has been reported as a necessary condition for aligned growth of carbon nanotubes. To clarify the mechanisms of nanotube alignment we performed numerical calculations of the electrical field in the collisional sheath and the resulting electric force acting on the metallic droplet on the nanotube tip. Based on the model calculation, dependences of the force on various parameters, e.g. distance between nanotubes, height of nanotubes and form of their tips, is discussed in detail. The theoretical model also predicts how this force depends on the direct current bias and the resistivity of the biased substrate.