Effects of seeding methods on the fabrication of microcrystalline silicon solar cells using radio frequency plasma enhanced chemical vapor deposition

Single junction p-i-n μc-Si:H solar cells were prepared in a low-cost, large-area single chamber radio frequency plasma enhanced chemical vapor deposition system. The effects of seeding processes on the growth of μc-Si:H i-layers and performance of μc-Si:H solar cells were investigated. Seeding proc...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 2005-07, Vol.483 (1), p.84-88
Main Authors: Li, Yuan-Min, Li, Liwei, Selvan, J.A. Anna, Delahoy, Alan E., Levy, Roland A.
Format: Article
Language:English
Subjects:
Applied sciences
Chemical vapor deposition
Energy
Exact sciences and technology
Natural energy
Nucleation
Photoelectric conversion: solar cells and arrays
Photovoltaic conversion
Silicon
Solar cells
Solar cells. Photoelectrochemical cells
Solar energy
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Single junction p-i-n μc-Si:H solar cells were prepared in a low-cost, large-area single chamber radio frequency plasma enhanced chemical vapor deposition system. The effects of seeding processes on the growth of μc-Si:H i-layers and performance of μc-Si:H solar cells were investigated. Seeding processes, usually featured by highly hydrogen rich plasma, are effective in inducing the growth of μc-Si:H i-layers. It has been demonstrated that p-layer seeding methods are preferable to i-layer seeding. While performance of μc-Si:H solar cells produced by i-layer seeding methods was usually limited by very low fill factors, μc-Si:H solar cells with good initial and stabilized conversion efficiencies were obtained by p-layer seeding.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2004.12.029