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Performance characteristics of an injection-controlled electron-beam pumped XeF(C to A) laser system
Characteristics of an injection-controlled electron-beam pumped XeF(C to A) laser are investigated with emphasis on efficient wideband tuning and scaling issues. Using a quasi-CW dye laser as an injection source, data are obtained that describe the laser characteristics over a wide parameter range....
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Published in: | IEEE journal of quantum electronics 1988-08, Vol.24 (8), p.1571-1578 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Characteristics of an injection-controlled electron-beam pumped XeF(C to A) laser are investigated with emphasis on efficient wideband tuning and scaling issues. Using a quasi-CW dye laser as an injection source, data are obtained that describe the laser characteristics over a wide parameter range. A high-Z electron-beam backscattering reflector inside the laser reaction cell improved the electron-beam energy deposition by 40%, resulting in an increase of the amplified laser output by more than a factor of four. Efficient and continuous wavelength tuning between 470 and 500 nm is achieved with an output energy density of approximately 1 J/l, and an intrinsic efficiency of approximately 1% throughout the entire tuning region.< > |
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ISSN: | 0018-9197 1558-1713 |
DOI: | 10.1109/3.7087 |