Early history of vacuum arc deposition

Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings,...

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Published in:IEEE transactions on plasma science 2001-10, Vol.29 (5), p.759-761
Main Author: Boxman, R.L.
Format: Article
Language:English
Subjects:
Arc deposition
Cathodes
Cathodic coating (process)
Coatings
Edison, Thomas Alva (1847-1931)
Electricity
Electrodes
Electron tubes
Experiments
Glass
Helium
History
Molds
Multilayers
Plasma
Replication
Scientists
Seeds
Shielding
Switches
Transistors
Vacuum arcs
Wright, Arthur W
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cited_by cdi_FETCH-LOGICAL-c336t-a8f4dbfed9927bfaf33b5fcc7ee8539d72ac75384da73a96a683c9d026fc71573
cites cdi_FETCH-LOGICAL-c336t-a8f4dbfed9927bfaf33b5fcc7ee8539d72ac75384da73a96a683c9d026fc71573
container_end_page 761
container_issue 5
container_start_page 759
container_title IEEE transactions on plasma science
container_volume 29
creator Boxman, R.L.
description Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.
doi_str_mv 10.1109/27.964470
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_28588187</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>964470</ieee_id><sourcerecordid>28588187</sourcerecordid><originalsourceid>FETCH-LOGICAL-c336t-a8f4dbfed9927bfaf33b5fcc7ee8539d72ac75384da73a96a683c9d026fc71573</originalsourceid><addsrcrecordid>eNp90L1LAzEYBvAgCtbq4Op0OFQcriZ58zlKqR9QcNE55HIJXrk2NbkT-t975YqDg9M7vD8eeB6ErgmeE4L1A5VzLRiT-ARNiAZdapD8FE0w1lCCInCOLnJeY0wYx3SCZkub2n3x2eQupn0RQ_FtXd9vCptcUftdzE3XxO0lOgu2zf7qeKfo42n5vngpV2_Pr4vHVekARFdaFVhdBV9rTWUVbACoeHBOeq846FpS6yQHxWorwWphhQKna0xFcJJwCVN0N-buUvzqfe7MpsnOt63d-thnowkTnHNKBzn7V1LFlSLqEHn7B65jn7ZDC0M0J0JixQZ0PyKXYs7JB7NLzcamvSHYHIY1VJpx2MHejLbx3v-64_MH64txNw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>195167084</pqid></control><display><type>article</type><title>Early history of vacuum arc deposition</title><source>IEEE Electronic Library (IEL) Journals</source><creator>Boxman, R.L.</creator><creatorcontrib>Boxman, R.L.</creatorcontrib><description>Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.</description><identifier>ISSN: 0093-3813</identifier><identifier>EISSN: 1939-9375</identifier><identifier>DOI: 10.1109/27.964470</identifier><identifier>CODEN: ITPSBD</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Arc deposition ; Cathodes ; Cathodic coating (process) ; Coatings ; Edison, Thomas Alva (1847-1931) ; Electricity ; Electrodes ; Electron tubes ; Experiments ; Glass ; Helium ; History ; Molds ; Multilayers ; Plasma ; Replication ; Scientists ; Seeds ; Shielding ; Switches ; Transistors ; Vacuum arcs ; Wright, Arthur W</subject><ispartof>IEEE transactions on plasma science, 2001-10, Vol.29 (5), p.759-761</ispartof><rights>Copyright Institute of Electrical and Electronics Engineers, Inc. (IEEE) Oct 2001</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c336t-a8f4dbfed9927bfaf33b5fcc7ee8539d72ac75384da73a96a683c9d026fc71573</citedby><cites>FETCH-LOGICAL-c336t-a8f4dbfed9927bfaf33b5fcc7ee8539d72ac75384da73a96a683c9d026fc71573</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/964470$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,27903,27904,54774</link.rule.ids></links><search><creatorcontrib>Boxman, R.L.</creatorcontrib><title>Early history of vacuum arc deposition</title><title>IEEE transactions on plasma science</title><addtitle>TPS</addtitle><description>Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.</description><subject>Arc deposition</subject><subject>Cathodes</subject><subject>Cathodic coating (process)</subject><subject>Coatings</subject><subject>Edison, Thomas Alva (1847-1931)</subject><subject>Electricity</subject><subject>Electrodes</subject><subject>Electron tubes</subject><subject>Experiments</subject><subject>Glass</subject><subject>Helium</subject><subject>History</subject><subject>Molds</subject><subject>Multilayers</subject><subject>Plasma</subject><subject>Replication</subject><subject>Scientists</subject><subject>Seeds</subject><subject>Shielding</subject><subject>Switches</subject><subject>Transistors</subject><subject>Vacuum arcs</subject><subject>Wright, Arthur W</subject><issn>0093-3813</issn><issn>1939-9375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNp90L1LAzEYBvAgCtbq4Op0OFQcriZ58zlKqR9QcNE55HIJXrk2NbkT-t975YqDg9M7vD8eeB6ErgmeE4L1A5VzLRiT-ARNiAZdapD8FE0w1lCCInCOLnJeY0wYx3SCZkub2n3x2eQupn0RQ_FtXd9vCptcUftdzE3XxO0lOgu2zf7qeKfo42n5vngpV2_Pr4vHVekARFdaFVhdBV9rTWUVbACoeHBOeq846FpS6yQHxWorwWphhQKna0xFcJJwCVN0N-buUvzqfe7MpsnOt63d-thnowkTnHNKBzn7V1LFlSLqEHn7B65jn7ZDC0M0J0JixQZ0PyKXYs7JB7NLzcamvSHYHIY1VJpx2MHejLbx3v-64_MH64txNw</recordid><startdate>20011001</startdate><enddate>20011001</enddate><creator>Boxman, R.L.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>F28</scope><scope>FR3</scope></search><sort><creationdate>20011001</creationdate><title>Early history of vacuum arc deposition</title><author>Boxman, R.L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c336t-a8f4dbfed9927bfaf33b5fcc7ee8539d72ac75384da73a96a683c9d026fc71573</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Arc deposition</topic><topic>Cathodes</topic><topic>Cathodic coating (process)</topic><topic>Coatings</topic><topic>Edison, Thomas Alva (1847-1931)</topic><topic>Electricity</topic><topic>Electrodes</topic><topic>Electron tubes</topic><topic>Experiments</topic><topic>Glass</topic><topic>Helium</topic><topic>History</topic><topic>Molds</topic><topic>Multilayers</topic><topic>Plasma</topic><topic>Replication</topic><topic>Scientists</topic><topic>Seeds</topic><topic>Shielding</topic><topic>Switches</topic><topic>Transistors</topic><topic>Vacuum arcs</topic><topic>Wright, Arthur W</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Boxman, R.L.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 1998–Present</collection><collection>IEEE Explore</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology &amp; Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on plasma science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Boxman, R.L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Early history of vacuum arc deposition</atitle><jtitle>IEEE transactions on plasma science</jtitle><stitle>TPS</stitle><date>2001-10-01</date><risdate>2001</risdate><volume>29</volume><issue>5</issue><spage>759</spage><epage>761</epage><pages>759-761</pages><issn>0093-3813</issn><eissn>1939-9375</eissn><coden>ITPSBD</coden><abstract>Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/27.964470</doi><tpages>3</tpages></addata></record>
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1939-9375
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source IEEE Electronic Library (IEL) Journals
subjects Arc deposition
Cathodes
Cathodic coating (process)
Coatings
Edison, Thomas Alva (1847-1931)
Electricity
Electrodes
Electron tubes
Experiments
Glass
Helium
History
Molds
Multilayers
Plasma
Replication
Scientists
Seeds
Shielding
Switches
Transistors
Vacuum arcs
Wright, Arthur W
title Early history of vacuum arc deposition
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T12%3A55%3A32IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Early%20history%20of%20vacuum%20arc%20deposition&rft.jtitle=IEEE%20transactions%20on%20plasma%20science&rft.au=Boxman,%20R.L.&rft.date=2001-10-01&rft.volume=29&rft.issue=5&rft.spage=759&rft.epage=761&rft.pages=759-761&rft.issn=0093-3813&rft.eissn=1939-9375&rft.coden=ITPSBD&rft_id=info:doi/10.1109/27.964470&rft_dat=%3Cproquest_cross%3E28588187%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c336t-a8f4dbfed9927bfaf33b5fcc7ee8539d72ac75384da73a96a683c9d026fc71573%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=195167084&rft_id=info:pmid/&rft_ieee_id=964470&rfr_iscdi=true