Properties and electrochromic performances of reactively sputtered tungsten oxide films with water as reactive gas

A change of water vapour partial pressure from 0 to 4 Pa was carried out in order to prepare sputtered tungsten oxide compounds with various oxygen and hydrogen concentrations. Oxygen, tungsten and hydrogen concentrations were determined by Rutherford Backscattering Spectroscopy (RBS) and by Elastic...

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Bibliographic Details
Published in:Surface & coatings technology 2005-10, Vol.200 (1-4), p.232-235
Main Authors: Sadiki, H., Pierson, J.F., Rousselot, C., Martin, N., Terwagne, G.
Format: Article
Language:English
Subjects:
Applied sciences
Cross-disciplinary physics: materials science
rheology
Electrochromic
Exact sciences and technology
Materials science
Metals. Metallurgy
Other topics in materials science
Physics
Production techniques
Reactive sputtering
Surface treatment
Tungsten oxide
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Summary:A change of water vapour partial pressure from 0 to 4 Pa was carried out in order to prepare sputtered tungsten oxide compounds with various oxygen and hydrogen concentrations. Oxygen, tungsten and hydrogen concentrations were determined by Rutherford Backscattering Spectroscopy (RBS) and by Elastic Recoil Detection (ERD) analysis. Structure of tungsten oxide films was analyzed by X-ray diffraction. At low water vapour partial pressure, the films are crystallized and WO2 and W3O phases were observed. The electrochromic performances of such film/SnO2/glass substrate system were measured and discussed taking into account the influence of the water vapour partial pressure injected into the deposition process on the structure, chemical composition and optical properties of the films.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2005.02.195