Designing Organic and Hybrid Surfaces and Devices with Initiated Chemical Vapor Deposition (iCVD)

The initiated chemical vapor deposition (iCVD) technique is an all‐dry method for designing organic and hybrid polymers. Unlike methods utilizing liquids or line‐of‐sight arrival, iCVD provides conformal surface modification over intricate geometries. Uniform, high‐purity, and pinhole‐free iCVD film...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2024-02, Vol.36 (8), p.e2306665-n/a
Main Author: Gleason, Karen K.
Format: Article
Language:English
Subjects:
Chemical vapor deposition
chemical vapor deposition (CVD)
conformal
Copolymers
Design optimization
Energy storage
Formability
free‐radical polymerization
Functional groups
hybrid organic–inorganic thin films
initiated CVD (iCVD) polymers
Liquids
Multilayers
Optoelectronics
organic thin films
Pinholes
Polymers
Refractivity
Substrates
Surface charge
Surface energy
Thickness
Two dimensional materials
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Description
Summary:The initiated chemical vapor deposition (iCVD) technique is an all‐dry method for designing organic and hybrid polymers. Unlike methods utilizing liquids or line‐of‐sight arrival, iCVD provides conformal surface modification over intricate geometries. Uniform, high‐purity, and pinhole‐free iCVD films can be grown with thicknesses ranging from >15 µm to
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.202306665