Loading…

Effect of annealing on photorefractive damage in titanium-indiffused LiNbO(3) modulators

We have evaluated photorefractive effects at 1320-nm and 1064-nm optical wavelengths in interferometric modulators built using Ti-indiffused waveguides in lithium niobate. The sensitivity to photorefractive damage is substantially increased by anneals in non-oxygen atmospheres at temperatures 200 de...

Full description

Saved in:
Bibliographic Details
Published in:IEEE photonics technology letters 1994-02, Vol.6 (2), p.211-213
Main Authors: Betts, G E, O' Donnell, F J, Ray, K G
Format: Article
Language:English
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We have evaluated photorefractive effects at 1320-nm and 1064-nm optical wavelengths in interferometric modulators built using Ti-indiffused waveguides in lithium niobate. The sensitivity to photorefractive damage is substantially increased by anneals in non-oxygen atmospheres at temperatures 200 deg C. The sensitivity can be reduced by an anneal in oxygen. Properly annealed modulators operated for 150 h with 400 mW at 1320 nm with no photorefractive effects other than a 3 deg change in bias point
ISSN:1041-1135
DOI:10.1109/68.275431