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Effect of annealing on photorefractive damage in titanium-indiffused LiNbO(3) modulators
We have evaluated photorefractive effects at 1320-nm and 1064-nm optical wavelengths in interferometric modulators built using Ti-indiffused waveguides in lithium niobate. The sensitivity to photorefractive damage is substantially increased by anneals in non-oxygen atmospheres at temperatures 200 de...
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Published in: | IEEE photonics technology letters 1994-02, Vol.6 (2), p.211-213 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Online Access: | Get full text |
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Summary: | We have evaluated photorefractive effects at 1320-nm and 1064-nm optical wavelengths in interferometric modulators built using Ti-indiffused waveguides in lithium niobate. The sensitivity to photorefractive damage is substantially increased by anneals in non-oxygen atmospheres at temperatures 200 deg C. The sensitivity can be reduced by an anneal in oxygen. Properly annealed modulators operated for 150 h with 400 mW at 1320 nm with no photorefractive effects other than a 3 deg change in bias point |
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ISSN: | 1041-1135 |
DOI: | 10.1109/68.275431 |