A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films

• Published in: Applied surface science 2005-09, Vol.252 (1), p.66-76
• Main Authors: Kothleitner, Gerald, Rogers, M., Berendes, A., Bock, W., Kolbesen, B.O.
• Format: Article
• Language: English
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Focused ion beam preparation (FIB); Physics; Rapid thermal processing (RTP); Secondary neutral mass spectrometry (SNMS); STEM/EELS; TEM gun monochromator; Vanadium nitride films
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2005.02.013

We investigated the diffusion profiles and core-loss fine-structures (ELNES) of thin vanadium nitride films by electron energy-loss spectroscopy (EELS) and energy filtering transmission electron microscopy (EFTEM). The nitride layers have been produced by rapid thermal processing in a NH 3 or N 2 atmosphere and have then been cross-sectioned with a focused ion beam instrument (FIB) under mild milling conditions to maintain crystallography. For the high-resolution electron energy-loss spectroscopy studies (HREELS), a recently developed TEM gun monochromator, implemented into a 200 kV field emission gun column was used in combination with a new post-column spectrometer. It was found that, dependent on substrate and atmosphere, layers with different vanadium and nitrogen content were formed, showing distinct differences in their ELNES. With an energy resolution at the 0.2 eV level and a TEM beam spot size of approximately 2 nm these layers could be unambiguously identified when compared to theoretical ELNES simulations from the literature.