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Miniaturised flow-through cell with integrated capacitive EIS sensor fabricated at wafer level using Si and SU-8 technologies

Eight different miniaturised flow-through cell configurations with integrated capacitive EIS (electrolyte–insulator–semiconductor) structures have been fabricated at wafer level. The EIS structures have been prepared by means of Si technique (electron-beam evaporation, thermal dry oxidation) and ser...

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Bibliographic Details
Published in:Sensors and actuators. B, Chemical Chemical, 2005-07, Vol.108 (1), p.986-992
Main Authors: Schöning, M.J., Näther, N., Auger, V., Poghossian, A., Koudelka-Hep, M.
Format: Article
Language:English
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Summary:Eight different miniaturised flow-through cell configurations with integrated capacitive EIS (electrolyte–insulator–semiconductor) structures have been fabricated at wafer level. The EIS structures have been prepared by means of Si technique (electron-beam evaporation, thermal dry oxidation) and serve as pH sensors. The channels for the miniaturised flow-through cell have been manufactured in SU-8 technique (spin-coating, exposure, developing, lift-off). The microcells have diameters of 200–2000 μm and volumes of 0.3–5 μl. The sensitive areas in the channels are ranging from 1.6 to 25 mm 2. For the realisation of a biosensor, the enzyme penicillinase has been immobilised into the channels on the EIS sensor chip. The electrochemical characterisation of the sensor set-up has been performed by capacitance/voltage ( C/ V) and constant capacitance (ConCap) mode, respectively.
ISSN:0925-4005
1873-3077
DOI:10.1016/j.snb.2004.12.029