Pulsed-Spray Radiofrequency Plasma Enhanced Chemical Vapor Deposition of CuInS2 Thin Films

Thin films of CuInS2 were grown on various substrates at a temperature of 523 K from two metal-organic precursors using radiofrequency plasma enhanced chemical vapor deposition (PECVD). Two precursor molecules, with different solubility properties, were dissolved in appropriate solvents and sprayed...

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Bibliographic Details
Published in:Plasma chemistry and plasma processing 2006-04, Vol.26 (2), p.137-148
Main Authors: Rodriguez, Rene G., Pulsipher, Daniel J. V., Lau, Lisa D., Shurdha, Endrit, Pak, Joshua J., Jin, Michael H., Banger, Kublinder K., Hepp, Aloysius F.
Format: Article
Language:English
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Summary:Thin films of CuInS2 were grown on various substrates at a temperature of 523 K from two metal-organic precursors using radiofrequency plasma enhanced chemical vapor deposition (PECVD). Two precursor molecules, with different solubility properties, were dissolved in appropriate solvents and sprayed into the plasma region in the PECVD chamber. The resulting films were examined for atomic composition, growth rate, crystalline orientation, and uniformity. Films made from each precursor differed in thickness, atomic composition, and crystallinity. The uniformity of the film was fairly good from near the edge to the center of the substrate, and evidence for a chalcopyrite-like structure was found in several samples deposited from one of the precursor molecules.
ISSN:0272-4324
1572-8986
DOI:10.1007/s11090-006-9018-2