Silicon microstructure fabricated by laser micro-patterning method combined with wet etching process

A simple method for silicon microfabrication has been successfully developed. Polypropylene (PP) film as a resist was prepared on a surface of silicon (Si) (1 0 0) plate by an rf magnetron sputtering method. A pulsed laser light was focused and irradiated to the PP film and a part of the film was re...

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Bibliographic Details
Published in:Applied surface science 2005-02, Vol.241 (1), p.223-226
Main Authors: Oishi, T., Goto, M., Pihosh, Y., Kasahara, A., Tosa, M.
Format: Article
Language:English
Subjects:
Applied sciences
Cross-disciplinary physics: materials science
rheology
Electronics
Exact sciences and technology
Laser ablation
Lithography, masks and pattern transfer
Materials science
Micro-machine
Micro-patterning
Microelectronic fabrication (materials and surfaces technology)
Microfabrication
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicon
Surface treatments
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Description
Summary:A simple method for silicon microfabrication has been successfully developed. Polypropylene (PP) film as a resist was prepared on a surface of silicon (Si) (1 0 0) plate by an rf magnetron sputtering method. A pulsed laser light was focused and irradiated to the PP film and a part of the film was removed by laser ablation process in the spot at certain laser intensity. When the sample was immersed in a potassium hydroxide solution, etching occurred only at the part that the PP film was removed by laser ablation. These results raise the possibility of this method as a process for Si microfabrication.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2004.09.044