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Chiral anomaly and Weyl orbit in three-dimensional Dirac semimetal Cd3As2grown on Si
Preparing Cd3As2, which is a three-dimensional (3D) Dirac semimetal in certain crystal orientation, on Si is highly desirable as such a sample may well be fully compatible with existing Si CMOS technology. However, there is a dearth of such a study regarding Cd3As2films grown on Si showing the chira...
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Published in: | Nanotechnology 2024-02, Vol.35 (16) |
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container_title | Nanotechnology |
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creator | Lin, Wei-Chen Tsai, Peng-Ying Zou, Jia-Zhu Lee, Jie-Ying Kuo, Chun-Wei Lee, Hsin-Hsuan Pan, Ching-Yang Yang, Cheng-Hsueh Chen, Sheng-Zong Wang, Jyh-Shyang Jiang, Pei-Hsun Liang, Chi-Te Chuang, Chiashain |
description | Preparing Cd3As2, which is a three-dimensional (3D) Dirac semimetal in certain crystal orientation, on Si is highly desirable as such a sample may well be fully compatible with existing Si CMOS technology. However, there is a dearth of such a study regarding Cd3As2films grown on Si showing the chiral anomaly. Here,for the first time, we report the novel preparation and fabrication technique of a Cd3As2(112) film on a Si (111) substrate with a ZnTe (111) buffer layer which explicitly shows the chiral anomaly with a nontrivial Berry's phase ofπ. Despite the Hall carrier density (n3D≈9.42×1017cm-3) of our Cd3As2film, which is almost beyond the limit for the portents of a 3D Dirac semimetal to emerge, we observe large linear magnetoresistance in a perpendicular magnetic field and negative magnetoresistance in a parallel magnetic field. These results clearly demonstrate the chiral magnetic effect and 3D Dirac semimetallic behavior in our silicon-based Cd3As2film. Our tailoring growth of Cd3As2on a conventional substrate such as Si keeps the sample quality, while also achieving a low carrier concentration. |
doi_str_mv | 10.1088/1361-6528/ad1941 |
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title | Chiral anomaly and Weyl orbit in three-dimensional Dirac semimetal Cd3As2grown on Si |
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