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Controlling the Plasma-Polymerization Process of N-Vinyl-2-pyrrolidone
N‐vinyl‐2‐pyrrolidone was plasma‐polymerized on glass substrates using a pulsed AC plasma. Pulsed AC plasma produces a chemical surface structure different from that produced by conventional RF plasma; this is ascribed to the different power regimes used. A high degree of control over the structure...
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Published in: | Plasma processes and polymers 2005-06, Vol.2 (5), p.414-423 |
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container_title | Plasma processes and polymers |
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creator | Norrman, Kion Winther-Jensen, Bjørn |
description | N‐vinyl‐2‐pyrrolidone was plasma‐polymerized on glass substrates using a pulsed AC plasma. Pulsed AC plasma produces a chemical surface structure different from that produced by conventional RF plasma; this is ascribed to the different power regimes used. A high degree of control over the structure of the chemical surface was obtained using pulsed AC plasma, as shown by ToF‐SIMS. It is demonstrated how the experimental conditions to some extent control the chemical structure of the plasma‐polymerized film, e.g., film thickness, density of post‐plasma‐polymerized oligomeric chains, and the density of intact pyrrolidone rings.
Electrode configuration and gas flow in the two‐phase AC plasma chamber. |
doi_str_mv | 10.1002/ppap.200400067 |
format | article |
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Electrode configuration and gas flow in the two‐phase AC plasma chamber.</description><subject>ATR FT-IR</subject><subject>N-vinyl-2-pyrrolidone</subject><subject>plasma polymerization</subject><subject>poly(vinyl pyrrolidone)</subject><subject>ToF-SIMS</subject><subject>XPS</subject><issn>1612-8850</issn><issn>1612-8869</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNqFkEFLwzAUgIsoOKdXzz15y3xJ2rQ7juKmMGeFqeAlZE2q0bSpSYfWX29HZXjz9B6873uHLwjOMUwwALlsGtFMCEAEACw5CEaYYYLSlE0P93sMx8GJ928AFOIURsE8s3XrrDG6fgnbVxXmRvhKoNyarlJOf4tW2zrMnS2U96EtwxV61HVnEEFN53pTS1ur0-CoFMars985Dh7mV-vsGi3vFjfZbIkKGqcJKgiTglKRJIRBiuWmlIKBJCRmasNApJKRFNM42uCYkLIkCqKiTJRIJBFSKToOLoa_jbMfW-VbXmlfKGNErezWczLFmEbAenAygIWz3jtV8sbpSriOY-C7XHyXi-9z9cJ0ED61Ud0_NM_zWf7XRYOrfau-9q5w77y_JjF_Wi04fr7PMM3X_Jb-AMDSfpg</recordid><startdate>20050614</startdate><enddate>20050614</enddate><creator>Norrman, Kion</creator><creator>Winther-Jensen, Bjørn</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20050614</creationdate><title>Controlling the Plasma-Polymerization Process of N-Vinyl-2-pyrrolidone</title><author>Norrman, Kion ; Winther-Jensen, Bjørn</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3587-c26da33a7726081dbfda60d2256eb60a8d6281354b1522ff2e04cf7ea7d2adee3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>ATR FT-IR</topic><topic>N-vinyl-2-pyrrolidone</topic><topic>plasma polymerization</topic><topic>poly(vinyl pyrrolidone)</topic><topic>ToF-SIMS</topic><topic>XPS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Norrman, Kion</creatorcontrib><creatorcontrib>Winther-Jensen, Bjørn</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Plasma processes and polymers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Norrman, Kion</au><au>Winther-Jensen, Bjørn</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Controlling the Plasma-Polymerization Process of N-Vinyl-2-pyrrolidone</atitle><jtitle>Plasma processes and polymers</jtitle><addtitle>Plasma Processes Polym</addtitle><date>2005-06-14</date><risdate>2005</risdate><volume>2</volume><issue>5</issue><spage>414</spage><epage>423</epage><pages>414-423</pages><issn>1612-8850</issn><eissn>1612-8869</eissn><abstract>N‐vinyl‐2‐pyrrolidone was plasma‐polymerized on glass substrates using a pulsed AC plasma. Pulsed AC plasma produces a chemical surface structure different from that produced by conventional RF plasma; this is ascribed to the different power regimes used. A high degree of control over the structure of the chemical surface was obtained using pulsed AC plasma, as shown by ToF‐SIMS. It is demonstrated how the experimental conditions to some extent control the chemical structure of the plasma‐polymerized film, e.g., film thickness, density of post‐plasma‐polymerized oligomeric chains, and the density of intact pyrrolidone rings.
Electrode configuration and gas flow in the two‐phase AC plasma chamber.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/ppap.200400067</doi><tpages>10</tpages></addata></record> |
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subjects | ATR FT-IR N-vinyl-2-pyrrolidone plasma polymerization poly(vinyl pyrrolidone) ToF-SIMS XPS |
title | Controlling the Plasma-Polymerization Process of N-Vinyl-2-pyrrolidone |
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